Dissolvable Template Nanoimprint Lithography: A Facile and Versatile Nanoscale Replication Technique
- Title
- Dissolvable Template Nanoimprint Lithography: A Facile and Versatile Nanoscale Replication Technique
- Author
- 오준호
- Keywords
- Nanoimprinting; template; insect wing; nanostructures; nanomanufacturing
- Issue Date
- 2020-08
- Publisher
- AMER CHEMICAL SOC
- Citation
- NANO LETTERS, v. 20, no. 10, page. 6989-6997
- Abstract
- Nanoimprinting lithography (NIL) is a next-generation nanofabrication method, capable of replicating nanostructures from original master surfaces. Here, we develop highly scalable, simple, and nondestructive NIL using a dissolvable template. Termed dissolvable template nanoimprinting lithography (DT-NIL), our method utilizes an economic thermoplastic resin to fabricate nanoimprinting templates, which can be easily dissolved in simple organic solvents. We used the DT-NIL method to replicate cicada wings which have surface nanofeatures of similar to 100 nm in height. The master, template, and replica surfaces showed a ˃similar to 94% similarity based on the measured diameter and height of the nanofeatures. The versatility of DT-NIL was also demonstrated with the replication of re-entrant, multiscale, and hierarchical features on fly wings, as well as hard silicon wafer-based artificial nanostructures. The DT-NIL method can be performed under ambient conditions with inexpensive materials and equipment. Our work opens the door to opportunities for economical and highthroughput nanofabrication processes.
- URI
- https://pubs.acs.org/doi/10.1021/acs.nanolett.0c01547https://repository.hanyang.ac.kr/handle/20.500.11754/164724
- ISSN
- 1530-6984
- DOI
- 10.1021/acs.nanolett.0c01547
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MECHANICAL ENGINEERING(기계공학과) > Articles
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