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Cathodoluminescence Characterization of GaN Thick Films Grown by Using the HVPE Method

Title
Cathodoluminescence Characterization of GaN Thick Films Grown by Using the HVPE Method
Author
오재응
Keywords
LAYERS; GALLIUM NITRIDE; VAPOR-PHASE EPITAXY
Issue Date
2000-12
Publisher
The Korean Physical Society
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 37, no. 6, page. 956-960
Abstract
Thick (> 200 mum) GaN films grown by hydride vapor-phase epitaxy (HVPE) were examined. High-quality films were examined by field emission scanning electron microscopy (FE-SEM), cathodoluminescence (CL) spectroscopy, and imaging. We carried out spatially resolved studies of film cross-sections and the interface side of the GaN films/sapphire as well as the top surfaces. The top surfaces of the films showed narrow band-edge emission lines while the cathodoluminescence spectra near the interface were broad and extended to energies above the band gap. Close to the interface, we were able to directly observe a region, about 20-mum thick, containing columnar structures.
URI
http://apps.webofknowledge.com/InboundService.do?customersID=LinksAMR&mode=FullRecord&IsProductCode=Yes&product=WOS&Init=Yes&Func=Frame&DestFail=http%3A%2F%2Fwww.webofknowledge.com&action=retrieve&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&SID=D6YCHoVOWJzJuzSPkxH&UT=WOS%3A000165908600034https://repository.hanyang.ac.kr/handle/20.500.11754/162361
ISSN
0374-4884; 1976-8524
DOI
10.3938/jkps.37.956
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > ELECTRICAL ENGINEERING(전자공학부) > Articles
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