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dc.contributor.author박진석-
dc.date.accessioned2021-03-09T06:11:00Z-
dc.date.available2021-03-09T06:11:00Z-
dc.date.issued2001-07-
dc.identifier.citation2001년도 대한전기학회 하계학술대회 논문집 C, page. 1349-1351en_US
dc.identifier.urihttps://www.dbpia.co.kr/journal/articleDetail?nodeId=NODE01326643?-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/160347-
dc.description.abstractPolycrystalline diamond films are deposited by using a microwave plama CVD system, where the bias-enhanced nucleation (BEN) method is employed. Effects of the varying microwave power, the surface treatment by hydrogen plasma, and the cyclic hydrogen etching during deposition on the crystallinity as well as on the surface roughness of deposited films are examined by Raman spectroscopy. SEM. and AFM. A novel method for achieving a smoother diamond surface is also suggested through the indirect wafer bonding and back-side polishing.en_US
dc.language.isoko_KRen_US
dc.publisherThe Korean Institute of Electrical Engineersen_US
dc.titleMPCVD 방법에 의해 증착된 다결정 다이아몬드 박막의 결정성 및 표면 거칠기 향상에 관한 연구en_US
dc.title.alternativeA study on the improvement of crystallinity and surface roughness of polycrystalline diamond films deposited by MPCVD methoden_US
dc.typeArticleen_US
dc.relation.journal전기학회논문지(A,B,C,D)-
dc.contributor.googleauthor신완철-
dc.contributor.googleauthor서수형-
dc.contributor.googleauthor박진석-
dc.relation.code2012101073-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF ENGINEERING SCIENCES[E]-
dc.sector.departmentDIVISION OF ELECTRICAL ENGINEERING-
dc.identifier.pidjinsp-
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COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > ELECTRICAL ENGINEERING(전자공학부) > Articles
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