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Measurement of sheath expansion in plasma source ion implantation
- Title
- Measurement of sheath expansion in plasma source ion implantation
- Author
- 김곤호
- Keywords
- Plasma source ion implantation; Time-dependent sheath; Ion wave; Langmuir prob
- Issue Date
- 2001-01
- Publisher
- Elsevier B.V.
- Citation
- Surface and Coatings Technology, v. 136, issue. 1-3, page. 97-101
- Abstract
- In plasma source ion implantation (PSII), the temporal and spatial sheath evolution in terms of the applied negative pulse on a plasnar target was investigated using a Langmuir probe. Experiments revealed that the dynamic sheath consists of three parts with respect to the phases of the pulse.
- URI
- https://www.sciencedirect.com/science/article/pii/S0257897200010355https://repository.hanyang.ac.kr/handle/20.500.11754/158767
- ISSN
- 0257-8972
- Appears in Collections:
- COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > ETC
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