Repository at Hanyang UniversityCOLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)ETC
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dc.contributor.author김곤호-
dc.date.accessioned2021-02-18T06:11:07Z-
dc.date.available2021-02-18T06:11:07Z-
dc.date.issued2001-01-
dc.identifier.citationSurface and Coatings Technology, v. 136, issue. 1-3, page. 97-101en_US
dc.identifier.issn0257-8972-
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0257897200010355-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/158767-
dc.description.abstractIn plasma source ion implantation (PSII), the temporal and spatial sheath evolution in terms of the applied negative pulse on a plasnar target was investigated using a Langmuir probe. Experiments revealed that the dynamic sheath consists of three parts with respect to the phases of the pulse.en_US
dc.language.isoen_USen_US
dc.publisherElsevier B.V.en_US
dc.subjectPlasma source ion implantationen_US
dc.subjectTime-dependent sheathen_US
dc.subjectIon waveen_US
dc.subjectLangmuir proben_US
dc.titleMeasurement of sheath expansion in plasma source ion implantationen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0257-8972(00)01035-5-
dc.relation.journalSURFACE & COATINGS TECHNOLOGY-
dc.contributor.googleauthorKim, Young-Woo-
dc.contributor.googleauthorKim, Gon-Ho-
dc.contributor.googleauthorHan, Seunghee-
dc.contributor.googleauthorLee, Yeonhee-
dc.contributor.googleauthorCho, Jeonghee-
dc.contributor.googleauthorRhee, Soo-Yong-
dc.relation.code2011208987-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF SCIENCE & TECHNOLOGY[E]-
dc.sector.departmentDIVISION OF SCIENCE & TECHNOLOGY-
dc.identifier.pidghkim-
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