Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 오혜근 | - |
dc.date.accessioned | 2021-02-09T05:54:38Z | - |
dc.date.available | 2021-02-09T05:54:38Z | - |
dc.date.issued | 2002-12 | - |
dc.identifier.citation | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, v. 20, issue. 6, page. 2206-2209 | en_US |
dc.identifier.issn | 2166-2746 | - |
dc.identifier.issn | 2166-2754 | - |
dc.identifier.uri | https://avs.scitation.org/doi/abs/10.1116/1.1513582 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/158053 | - |
dc.description.abstract | The thin-film formation of the spin coating is one of the important factors in the fabrication of microelectronic devices. In this study, the theoretical models for thickness variation during spin coating and nanotopography impact are analyzed. The finite-difference-time-domain method and the finite-element method are used to solve the convective diffusion equation for solvent distribution and the Navier-Stokes equation including solvent evaporation for the film thickness change. These numerical calculations are in good agreement with experimental results for 193 nm chemically amplified resist (CAR) and i-line non-CAR resists. Solvent distributions of nonspin coating are described through mesoscale modeling by using the Monte Carlo method. Nanotopography impact on the variation of resist distribution after spin coating is investigated quantitatively. The reason for the similarity in the transfer functions for different types of wafers is due to solvent diffusion and evaporation. (C) 2002 American Vacuum Society. | en_US |
dc.description.sponsorship | This work was supported by the Ministry of Information and Communication of Korea [Support Project of University Information Technology Research Center supervised by KIPA(Korea IT Industry Promotion Agency}]. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | A V S AMER INST PHYSICS | en_US |
dc.title | Resist distribution effect of spin coating | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1116/1.1513582 | - |
dc.relation.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.contributor.googleauthor | Kim, Sang-Kon | - |
dc.contributor.googleauthor | Yoo, Ji-Yong | - |
dc.contributor.googleauthor | Oh, Hye-Keun | - |
dc.relation.code | 2009206100 | - |
dc.sector.campus | E | - |
dc.sector.daehak | COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E] | - |
dc.sector.department | DEPARTMENT OF APPLIED PHYSICS | - |
dc.identifier.pid | hyekeun | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.