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Investigation of ramped voltage stress to screen defective magnetic tunnel junctions

Title
Investigation of ramped voltage stress to screen defective magnetic tunnel junctions
Author
송윤흡
Keywords
reliability; magnetic memory; device reliability
Issue Date
2018-01
Publisher
IOP PUBLISHING LTD
Citation
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, v. 33, no. 1, Article no. 015006
Abstract
A ramped voltage stress (RVS) method to screen defective magnetic tunnel junctions (MTJs) is investigated in order to improve screen accuracy and shorten test time. Approximately 1500 MTJs with 1.25 nm thick tunnel barriers were fabricated for this evaluation, and normal MTJs show a 189% tunnel magnetoresistance ratio, a 365 Omega m(2) resistance-area product, and a 1.8 V breakdown voltage, which is enough for applying reliable screen tests. We successfully classified MTJs as normal MTJs having good characteristics or defective MTJs having insufficient endurance and showing resistance degradation after only short-term cycling. Using the RVS screen test with low ramp speed, it is demonstrated that remarkable screening performance and little dependence on temperature are obtained for short test time.
URI
https://iopscience.iop.org/article/10.1088/1361-6641/aa99bbhttps://repository.hanyang.ac.kr/handle/20.500.11754/117227
ISSN
0268-1242; 1361-6641
DOI
10.1088/1361-6641/aa99bb
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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