Crystal characteristics of bulk GaN single crystal grown by HVPE method with the increase of thickness

Abstract

Although GaN has been used in optical materials and power devices, the extent of its application is determined by the crystal quality. Bulk GaN has been reported to produce high-quality GaN. Therefore, it can be used in applications that require high-quality crystals, such as high-brightness light-emitting diode, power devices, etc. We grew a 2-inch bulk GaN crystal, using the hydride vapor phase epitaxy (HVPE) method, on a sapphire substrate to a thickness of similar to 5 mm. X-ray diffraction (XRD) was used to analyze the structure of GaN. Scanning electron microscopy (SEM) was used to measure the etch pits density (EPD) of GaN after wet chemical etching. In addition, high-resolution XRD (HR-XRD) and Raman spectrometry were employed for radius of curvature and residual strains measurements, respectively.