2006-11 | Large scale directed assembly of nanoparticles using nanotrench templates | 박진구 |
2015-02 | Large-Scale Plasma Patterning of Transparent Graphene Electrode on Flexible Substrates | 박진구 |
2015-03 | Large-Scale Plasma Patterning of Transparent Graphene Electrode on Flexible Substrates | 박진구 |
2003-02 | Laser Shock Removal of Micro and Nanoscale Particles | 박진구 |
2005-07 | Laser Shock Removal of Nanoparticles from Si Capping Layer of Extreme Ultraviolet Lithography Masks | 박진구 |
2012-12 | Material removal mechanism of single and polycrystalline silicon in alkaline slurry | 박진구 |
2015-04 | Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography | 박진구 |
2015-08 | Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography | 박진구 |
2021-02 | Mechanism of PVA Brush Loading with Ceria Particles during Post-CMP Cleaning Process | 박진구 |
2021-03 | Mechanisms of colloidal ceria contamination and cleaning during oxide post CMP cleaning | 박진구 |
2006-09 | Metal CMP 용 컨디셔너 디스크 표면에 존재하는 다이아몬드의 형상이 미치는 패드 회복력 변화 | 박진구 |
2017-12 | Metal Surface Chemical Composition and Morphology | 박진구 |
2016-12 | Modification of DHF for removal of metals from silicon wafer | 박진구 |
2013-04 | Modification of Diamond Conditioner with V-SAM Coatings for Corrosion Prevention During Metal CMP | 박진구 |
2013-04 | Modification of Diamond Conditioner with V-SAM Coatings for Corrosion Prevention During Metal CMP | 박진구 |
2015-03 | Multi-Stack Extreme-Ultraviolet Pellicle with Out-of-Band Reduction | 박진구 |
2015-05 | Multi-stack extreme-ultraviolet pellicle with out-of-band reduction | 박진구 |
2015-10 | Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction | 박진구 |
2015-10 | Multistack structure for an extreme-ultraviolet pellicle with out-of-band radiation reduction | 박진구 |
2011-10 | Nano Gas Cluster Dry Cleaning for Damage Free Particle Removal | 박진구 |