2018-10 | Characteristics of Copper Microspheres Grown by Using Mixed-Source Hydride Vapor-Phase Epitaxy | 안지훈 |
2019-10 | Comparative study of the electrical characteristics of ALD-ZnO thin films using H2O and H2O2 as the oxidants | 안지훈 |
2019-03 | Comparative study of the electrical characteristics of ALD‐ZnO thin films using H2O and H2O2 as the oxidants | 안지훈 |
2017-06 | Compositional and electrical modulation of niobium oxide thin films deposited by plasma-enhanced atomic layer deposition | 안지훈 |
2018-05 | The Correlation Between the Preferred Orientation and Al Distribution of Al-Doped HfO2 Films by Plasma-Enhanced Atomic Layer Deposition | 안지훈 |
2017-01 | Depletion effect of polycrystalline-silicon gate electrode by phosphorus deactivation | 안지훈 |
2021-05 | Effect of NH3 flow on electrical and mechanical properties of ALD TiN thin films | 안지훈 |
2020-12 | Effects of plasma conditions on sulfurization of MoO3 thin films and surface evolution for formation of MoS2 at low temperatures | 안지훈 |
2023-06 | Enhanced dielectric and energy storage performances of Hf0.6Zr0.4O2 thin films by Al doping | 안지훈 |
2020-11 | Enhanced electrical properties of ZrO2-TiN based capacitors by introducing ultrathin metal oxides | 안지훈 |
2023-11 | Enhanced physical and electrical properties of HfO2 deposited by atomic layer deposition using a novel precursor with improved thermal stability | 안지훈 |
2022-08 | Equivalent oxide thickness scalability of Zr-rich ZrHfO2 thin films by Al-doping | 안지훈 |
2021-12 | Evaluating the performance and characteristics of Rutile TiO2 thin film for Triboelectric Nanogenerator (TENG) | 안지훈 |
2018-08 | Fabrication of Microholes in Silicon Wafers by Using Wet-Chemical Etching | 안지훈 |
2017-02 | Frank–van der Merwe Growth versus Volmer–Weber Growth in Successive Stacking of a Few-Layer Bi2Te3/Sb2Te3 by van der Waals Heteroepitaxy: The Critical Roles of Finite Lattice-Mismatch with Seed Substrates | 안지훈 |
2020-10 | Growth characteristics of tin sulphides crystals by the vapour transport method using SnS and sulphur powders: effect of temperature and pressure | 안지훈 |
2019-07 | Growth of rutile-TiO2 thin films via Sn doping and insertion of ultra-thin SnO2 interlayer by atomic layer deposition | 안지훈 |
2023-06-12 | High-quality SiNx thin-film growth at 300 & DEG | 안지훈 |
2024-05-15 | Highly area-selective atomic layer deposition of device-quality Hf1-xZrxO2 thin films through catalytic local activation | 안지훈 |
2022-07 | Highly Stable Artificial Synapses Based on Ferroelectric Tunnel Junctions for Neuromorphic Computing Applications | 안지훈 |