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Study of Ruthenium Oxides Species on Ruthenium Chemical Mechanical Planarization Using Periodate-Based Slurry

Title
Study of Ruthenium Oxides Species on Ruthenium Chemical Mechanical Planarization Using Periodate-Based Slurry
Author
박재근
Keywords
IMPEDANCE SPECTROSCOPY; DIFFUSION BARRIER; SURFACE-REACTIONS; SODIUM PERIODATE; THIN-FILMS; COPPER; ELECTRODEPOSITION; CORROSION; MEDIA; CMP
Issue Date
2012-01
Publisher
ELECTROCHEMICAL SOCIETY INC
Citation
Journal of the Electrochemical Society, 2012, 159(3), P.H335-H341, 7P.
Abstract
Ruthenium (Ru) chemical mechanical planarization (CMP) with a slurry using sodium periodate (NaIO4) as an oxidizer was carried out as a function of pH. The Ru polishing rate was highest at pH 7 and decreased as the pH decreased or increased. In addition, a similar trend in the corrosion current density as a function of pH was found. Two equivalent circuit models were proposed to explain the electrochemical impedance spectroscopy (EIS) results of Ru in NaIO4 solution as a function of pH. From results of EIS, we found that the Ru film had a lowest charge transfer resistance in a neutral region than that in an acidic or alkaline region. This different charge transfer resistance of the Ru film as a function of pH resulted from the different surface composition of Ru oxide species, which was analyzed with X-ray photoelectron spectroscopy. Finally, we briefly derived a series of reaction equations between Ru and NaIO4 on the basis of the above results and discussion.
URI
http://jes.ecsdl.org/content/159/3/H335http://hdl.handle.net/20.500.11754/52775
ISSN
0013-4651
DOI
10.1149/2.103203jes
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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