Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 박재근 | - |
dc.date.accessioned | 2018-03-27T00:09:38Z | - |
dc.date.available | 2018-03-27T00:09:38Z | - |
dc.date.issued | 2012-01 | - |
dc.identifier.citation | Journal of the Electrochemical Society, 2012, 159(3), P.H335-H341, 7P. | en_US |
dc.identifier.issn | 0013-4651 | - |
dc.identifier.uri | http://jes.ecsdl.org/content/159/3/H335 | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11754/52775 | - |
dc.description.abstract | Ruthenium (Ru) chemical mechanical planarization (CMP) with a slurry using sodium periodate (NaIO4) as an oxidizer was carried out as a function of pH. The Ru polishing rate was highest at pH 7 and decreased as the pH decreased or increased. In addition, a similar trend in the corrosion current density as a function of pH was found. Two equivalent circuit models were proposed to explain the electrochemical impedance spectroscopy (EIS) results of Ru in NaIO4 solution as a function of pH. From results of EIS, we found that the Ru film had a lowest charge transfer resistance in a neutral region than that in an acidic or alkaline region. This different charge transfer resistance of the Ru film as a function of pH resulted from the different surface composition of Ru oxide species, which was analyzed with X-ray photoelectron spectroscopy. Finally, we briefly derived a series of reaction equations between Ru and NaIO4 on the basis of the above results and discussion. | en_US |
dc.description.sponsorship | This investigation was financially supported by Semiconductor Industry Collaborative Project between Hanyang University and Samsung Electronics Co. Ltd., and the Brain Korea 21 Project in 2011. We also thank Sumco Corp. for helping us with the experiments. | en_US |
dc.language.iso | en | en_US |
dc.publisher | ELECTROCHEMICAL SOCIETY INC | en_US |
dc.subject | IMPEDANCE SPECTROSCOPY | en_US |
dc.subject | DIFFUSION BARRIER | en_US |
dc.subject | SURFACE-REACTIONS | en_US |
dc.subject | SODIUM PERIODATE | en_US |
dc.subject | THIN-FILMS | en_US |
dc.subject | COPPER | en_US |
dc.subject | ELECTRODEPOSITION | en_US |
dc.subject | CORROSION | en_US |
dc.subject | MEDIA | en_US |
dc.subject | CMP | en_US |
dc.title | Study of Ruthenium Oxides Species on Ruthenium Chemical Mechanical Planarization Using Periodate-Based Slurry | en_US |
dc.type | Article | en_US |
dc.relation.no | 3 | - |
dc.relation.volume | 159 | - |
dc.identifier.doi | 10.1149/2.103203jes | - |
dc.relation.page | 335-341 | - |
dc.relation.journal | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | - |
dc.contributor.googleauthor | Cui, Hao | - |
dc.contributor.googleauthor | Park, Jin-Hyung | - |
dc.contributor.googleauthor | Park, Jea-Gun | - |
dc.relation.code | 2012205950 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DEPARTMENT OF ELECTRONIC ENGINEERING | - |
dc.identifier.pid | parkjgl | - |
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