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COLLEGE OF ENGINEERING[S](공과대학)
MATERIALS SCIENCE AND ENGINEERING(신소재공학부)
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Results 1-10 of 19 (Search time: 0.006 seconds).
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Issue Date
Title
Author(s)
2018-07
Leakage current suppression in spatially controlled Si-doped ZrO2 for capacitors using atomic layer deposition
전형탁
2020-11
Atomic layer deposition of titanium dioxide films using a metal organic precursor (C12H23N3Ti) and H2O (DI water)
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2018-01
Characteristics of low-kappa SiOC films deposited via atomic layer deposition
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2011-09
The effects of post-annealing on the performance of ZnO thin film transistors
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2012-12
Effects of Ar plasma treatment for deposition of ruthenium film by remote plasma atomic layer deposition
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2012-12
Effects of a SiO2 buffer layer on the flatband voltage shift of La2O3 gate dielectric grown by using remote plasma atomic layer deposition
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2012-12
Gadolinium nitride films deposited using a PEALD based process
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2018-10
Density control of ZnO nanorod arrays using ultrathin seed layer by atomic layer deposition
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2019-12
Atomic layer deposition growth of SnS2 films on diluted buffered oxide etchant solution-treated substrate
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2019-10
MIT characteristic of VO2 thin film deposited by ALD using vanadium oxytriisopropoxide precursor and H2O reactant
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Dielectrics
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Direct plating
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Dynamic random access memory
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Field effect transistor
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Gadolinium compounds
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High-k material
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2020 - 2022
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