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Fabrication of on-chip fluidic channels incorporating nanopores using self-aligned double layer resist processing technique

Title
Fabrication of on-chip fluidic channels incorporating nanopores using self-aligned double layer resist processing technique
Author
이승백
Issue Date
2012-12
Publisher
American Vacuum Society; 1999
Citation
Journal of Vacuum Science & Technology. B, 2012, 30(6), P.06F802
Abstract
The authors report on the development of a self-aligned double layer resist processing technique that allows incorporation of ion channel nanopores into on-chip microfluidic channels. The patterned positive/negative electron-beam resist double layer acts as a sacrificial template for the fabrication of on-chip fluidic channels and the nanopores. By controlling the resist dimensions, it was possible to tailor the shape of the on-chip fluidic channel and the nanopore dimensions. Using this technique, the authors demonstrated the fabrication of sub-10 nm nanopore arrays on 2 mu m wide and 800nm high on-chip fluidic channels. With further developments, it will be possible to have controllable on-chip nanopores with integrated nanofluidics. (C) 2012 American Vacuum Society. [http://dx.doi.org.access.hanyang.ac.kr/10.1116/1.4767234]
URI
https://avs.scitation.org/doi/10.1116/1.4767234http://hdl.handle.net/20.500.11754/51023
ISSN
1071-1023; 2166-2746
DOI
10.1116/1.4767234
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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