Development of in-situ SUB-100nm particle detection in vacuum system
- Title
- Development of in-situ SUB-100nm particle detection in vacuum system
- Author
- 안강호
- Keywords
- particle charging in vacuum; vacuum particle; semiconductor processing equipment; monodisperse particle; corona charging; Faraday cup
- Issue Date
- 2006-10
- Publisher
- Trans Tech Publications Ltd.
- Citation
- Key Engineering Materials, v. 321-323, Page. 1707-1710
- Abstract
- A feasibility test for real-time fine particle measurements in vacuum semiconductor processing equipment has been conducted. The approach in monitoring particles in process equipment is an installation of a sensor at a critical location inside the process equipment (hence the term 'in-situ') to track free particle levels in real-time. Common method for particle detection in a process chamber today is a use of test wafer with a laser wafer scanner. However, this method does not give a real time information of the particle status in the process chamber. In this paper, a new method has been developed to detect particles in real time in vacuum system for particles smaller than an optical method can detect. The system consists of a particle charging region and a particle detection region in a vacuum system. Particles with 50nm are successfully detected at about 10 torr region.
- URI
- https://www.scientific.net/KEM.321-323.1707https://repository.hanyang.ac.kr/handle/20.500.11754/182600
- ISSN
- 1013-9826;1662-9795
- DOI
- 10.4028/www.scientific.net/KEM.321-323.1707
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MECHANICAL ENGINEERING(기계공학과) > Articles
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