Repository at Hanyang UniversityCOLLEGE OF ENGINEERING SCIENCES[E](공학대학)MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과)Articles
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Post-CMP Cleaning
- Title
- Post-CMP Cleaning
- Author
- 박진구
- Keywords
- Double-sided scrubber and spin-rinse dryer; Hydrodynamic boundary layer; Single-wafer megasonic cleaner
- Issue Date
- 2007-03
- Publisher
- John Wiley & Sons, Inc.
- Citation
- Microelectronic Applications of Chemical Mechanical Planarization, Page. 467-509
- URI
- https://onlinelibrary.wiley.com/doi/10.1002/9780470180907.ch16https://repository.hanyang.ac.kr/handle/20.500.11754/181283
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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