Optimization of DIO 3with megasonic cleaning of Ru capped EUVL mask for effective carbon contaminant removal
- Title
- Optimization of DIO 3with megasonic cleaning of Ru capped EUVL mask for effective carbon contaminant removal
- Author
- 박진구
- Issue Date
- 2011-00
- Publisher
- Electrochemical Society, Inc.
- Citation
- ECS Transactions, v. 41, NO. 5, Page. 131-138
- Abstract
- A possible candidate for carbon contaminant removal in Ru capped EUVL mask is ozone dissolved water (DIO 3). However, the use of DIO 3 leaves reflectivity loss and serious surface damages on Ru capping layer caused by its high oxidation potential. In this study, an optimum DIO 3 cleaning condition for effective carbon cleaning without surface damage was investigated both theoretically and experimentally. The effect of additive gases such as O 2, CO 2 and N 2 of various concentrations were tried during DIO 3 generation for oxidation stability on Ru capping layer and N 2 added 15 ppm DIO 3 was found to be the best condition. However carbon contaminant was ineffectively removed at this condition. Thus megasonic is irradiated during DIO 3 process and the results show that carbon is not only completely removed in a shorter time but also lower reflectivity loss was accomplished with minimal increase in the surface roughness. ©The Electrochemical Society.
- URI
- https://iopscience.iop.org/article/10.1149/1.3630836https://repository.hanyang.ac.kr/handle/20.500.11754/181234
- ISSN
- 1938-5862;1938-6737
- DOI
- 10.1149/1.3630836
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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