Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 안진호 | - |
dc.date.accessioned | 2018-11-28T06:46:04Z | - |
dc.date.available | 2018-11-28T06:46:04Z | - |
dc.date.issued | 2016-09 | - |
dc.identifier.citation | 반도체디스플레이기술학회지, v. 15, NO 3, Page. 1-5 | en_US |
dc.identifier.issn | 1738-2270 | - |
dc.identifier.uri | https://www.kci.go.kr/kciportal/ci/sereArticleSearch/ciSereArtiView.kci?sereArticleSearchBean.artiId=ART002153489 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/80679 | - |
dc.description.abstract | In order to apply sub-resolution assist feature (SRAF) in extreme ultraviolet lithography, the maximum non-printing SRAF width and lithography process margin needs to be improved. Through simulation, we confirmed that the maximum SRAF width of 6% attenuated phase shift mask (PSM) is large compared to conventional binary intensity mask. The increase in SRAF width is due to dark region’s reflectivity of PSM which consequently improves the process window. Furthermore, the critical dimension error caused by variation of SRAF width and center position is reduced by lower change in diffraction amplitude. Therefore, we speculate that the margin of SRAF application will be improved by using PSM. | en_US |
dc.description.sponsorship | 이 논문은 한국 정부 (MSIP)에서 후원하는 한국연구재단 (National Research Foundation of Korea, NRF) 의 기초연구 사업 (Grant No.2011-0028570)및 KLA-Tencor 사의 PROLITHTM 에 의하여 지원되었음. | en_US |
dc.language.iso | ko_KR | en_US |
dc.publisher | 한국반도체디스플레이기술학회 | en_US |
dc.subject | EUVL | en_US |
dc.subject | phase shift mask | en_US |
dc.subject | sub-resolution assist feature | en_US |
dc.subject | lithography simulation | en_US |
dc.subject | imaging performance | en_US |
dc.title | 극자외선 리소그라피에서의Sub-resolution assist feature를 이용한 근접효과보정 | en_US |
dc.title.alternative | Optical proximity correction using sub-resolution assist feature in extreme ultraviolet lithography | en_US |
dc.type | Article | en_US |
dc.relation.no | 3 | - |
dc.relation.volume | 15 | - |
dc.relation.page | 1-5 | - |
dc.relation.journal | 반도체디스플레이기술학회지 | - |
dc.contributor.googleauthor | 김정식 | - |
dc.contributor.googleauthor | 홍성철 | - |
dc.contributor.googleauthor | 장용주 | - |
dc.contributor.googleauthor | 안진호 | - |
dc.contributor.googleauthor | Kim, Jung Sik | - |
dc.contributor.googleauthor | Hong, Seongchul | - |
dc.contributor.googleauthor | Jang, Yong Ju | - |
dc.contributor.googleauthor | Ahn, Jinho | - |
dc.relation.code | 2016018797 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF MATERIALS SCIENCE AND ENGINEERING | - |
dc.identifier.pid | jhahn | - |
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