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dc.contributor.author정두석-
dc.date.accessioned2018-08-31T07:11:56Z-
dc.date.available2018-08-31T07:11:56Z-
dc.date.issued2016-07-
dc.identifier.citationNANOSCALE (2016), v. 8, no. 34, page. 15621-15628en_US
dc.identifier.issn2040-3364-
dc.identifier.issn2040-3372-
dc.identifier.urihttp://pubs.rsc.org/en/Content/ArticleLanding/2016/NR/C6NR04072A#!divAbstract-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/74693-
dc.description.abstractWe present 'unusual' resistive switching behaviours in electrochemical metallization (ECM) cells utilizing a dual-layer (SiOx/GeSex: SiOx on GeSex) solid electrolyte (SE). The observed switching behaviour markedly varies with the thickness of the upper SiOx layer and compliance current: (i) monostable switching, (ii) counter-eightwise bipolar switching, and (iii) combination of monostable and eightwise bipolar switching behaviours. Focusing on cases (i) and (iii), electrical and chemical analyses on these chameleonic cells were performed in an attempt to gain clues to the understanding of the observed complexity. The chemical analysis indicated the upper SiOx layer as a chemical potential well for Cu ions-Cu ions were largely confined in the well. This non-uniform distribution of Cu across the SE perhaps hints at the mechanism for the complex behaviour; it may be a 'zero-sum game' between SiOx and GeSex layers, in which the two layers fight over the limited number of Cu atoms/ions.en_US
dc.description.sponsorshipD. S. J. acknowledges a Korea Institute of Science and Technology grant (grant no. 2E26691), and C. S. H. acknowledges the support of the Global Research Laboratory Program (2012040157) through the National Research Foundation (NRF) of Korea.en_US
dc.language.isoenen_US
dc.publisherROYAL SOC CHEMISTRYen_US
dc.subjectATOMIC SWITCHen_US
dc.subjectMEMORY CELLSen_US
dc.subjectNANOIONICSen_US
dc.subjectSYNAPSESen_US
dc.subjectBIPOLARen_US
dc.subjectCUen_US
dc.titleChameleonic electrochemical metallization cells: dual-layer solid electrolyte-inducing various switching behavioursen_US
dc.typeArticleen_US
dc.identifier.doi10.1039/c6nr04072a-
dc.relation.journalNANOSCALE-
dc.contributor.googleauthorLim, Hyungkwang-
dc.contributor.googleauthorSoni, Rohit-
dc.contributor.googleauthorKim, Dohun-
dc.contributor.googleauthorKim, Guhyun-
dc.contributor.googleauthorKornijcuk, Vladimir-
dc.contributor.googleauthorKim, Inho-
dc.contributor.googleauthorPark, Jong-Keuk-
dc.contributor.googleauthorHwang, Cheol Seong-
dc.contributor.googleauthorJeong, Doo Seok-
dc.relation.code2016000163-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDIVISION OF MATERIALS SCIENCE AND ENGINEERING-
dc.identifier.piddooseokj-
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COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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