Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 안진호 | - |
dc.date.accessioned | 2018-08-10T01:07:57Z | - |
dc.date.available | 2018-08-10T01:07:57Z | - |
dc.date.issued | 2016-07 | - |
dc.identifier.citation | 대한금속·재료학회지, v. 54, NO 7, Page. 546-551 | en_US |
dc.identifier.issn | 1738-8228 | - |
dc.identifier.uri | http://210.101.116.102/journal_korea/detail_01.asp?a_key=3443518 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/74413 | - |
dc.description.abstract | Extreme ultraviolet lithography (EUVL) runs in reflective optics and the shadowing effect causes several new issues limiting the performance of EUV mask. To get over this shadowing effect, many studies are made by reducing the absorber thickness with high extinction coefficient materials. Nickel is a promising absorber material candidate which can replace tantalum compounds due to its high extinction coefficient. However, nickel is vulnerable to conventional mask cleaning process. In this paper, novel Ta-Ni compound material is fabricated by co-sputtering process and its improved chemical durability and shadowing effect is presented. †(Received April 25, 2016; Accepted May 4, 2016) | en_US |
dc.description.sponsorship | 이 논문은 한국 정부(MSIP)에서 후원하는 한국연구재단 (National Research Foundation of Korea, NRF)의 기초연구사업에 의하여 지원되었음 (Grant No.2011-0028570). | en_US |
dc.language.iso | ko_KR | en_US |
dc.publisher | 대한금속·재료학회 | en_US |
dc.subject | extreme ultraviolet lithography | en_US |
dc.subject | semiconductor | en_US |
dc.subject | sputtering | en_US |
dc.subject | optical properties | en_US |
dc.subject | computer | en_US |
dc.title | 그림자 효과 완화 및 내화학성 향상을 위한 탄탈륨-니켈 화합물 극자외선 흡수체 | en_US |
dc.title.alternative | Ta-Ni Compound EUV Absorber Material to Mitigate Shadowing Effect and Improve Chemical Durability | en_US |
dc.type | Article | en_US |
dc.relation.no | 7 | - |
dc.relation.volume | 54 | - |
dc.identifier.doi | 10.3365/KJMM.2016.54.7.546 | - |
dc.relation.page | 546-551 | - |
dc.relation.journal | 대한금속·재료학회지 | - |
dc.contributor.googleauthor | 우동곤 | - |
dc.contributor.googleauthor | 홍성철 | - |
dc.contributor.googleauthor | 김정식 | - |
dc.contributor.googleauthor | 양철규 | - |
dc.contributor.googleauthor | 이종화 | - |
dc.contributor.googleauthor | 신철 | - |
dc.contributor.googleauthor | 안진호 | - |
dc.contributor.googleauthor | Woo, Dong Gon | - |
dc.contributor.googleauthor | Hong, Seongchul | - |
dc.contributor.googleauthor | Kim, Jung Sik | - |
dc.contributor.googleauthor | Yang, Chul Kyu | - |
dc.contributor.googleauthor | Lee, Jong Hwa | - |
dc.contributor.googleauthor | Shin, Chul | - |
dc.contributor.googleauthor | Ahn, Jinho | - |
dc.relation.code | 2016018727 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF MATERIALS SCIENCE AND ENGINEERING | - |
dc.identifier.pid | jhahn | - |
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