226 0

Full metadata record

DC FieldValueLanguage
dc.contributor.author송윤흡-
dc.date.accessioned2018-07-24T06:03:34Z-
dc.date.available2018-07-24T06:03:34Z-
dc.date.issued2016-06-
dc.identifier.citationMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v. 47, Page. 1-6en_US
dc.identifier.issn1369-8001-
dc.identifier.issn1873-4081-
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S1369800116300270?via%3Dihub-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/72695-
dc.description.abstractWe have investigated the contact resistivity of GeCu2Te3 (GCT) phase change material to a W electrode using the circular transfer length method (CTLM). The contact resistivity rho(c) of as-deposited amorphous GCT to W was 3.9 x 10(-2) Omega cm(2). The value of rho(c) drastically decreased upon crystallization and crystalline GCT that annealed at 300 degrees C showed a rho(c) of 4.8 x 10(-6) Omega cm(2). The rho(c) contrast between amorphous (as-deposited) and crystalline (annealed at 300 degrees C) states was larger in GCT than in conventional Ge2Sb2Te5 (GST). Consequently, it was suggested from a calculation based on a simple vertical structure memory cell model that a GCT memory cell shows a four times larger resistance contrast than a GST memory cell. (C) 2016 Elsevier Ltd. All rights reserved.en_US
dc.description.sponsorshipThe authors thank Dr. P. Fons of AIST, Japan, for help in the preparation of the manuscript. This work was supported by KAKENHI (Grant no. 15H04113) and Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, CT and Future Planning (NRF-2015R1A2A2A01007289).en_US
dc.language.isoenen_US
dc.publisherELSEVIER SCI LTDen_US
dc.subjectTHIN-FILMSen_US
dc.subjectGE2SB2TE5en_US
dc.titleContact resistivity of amorphous and crystalline GeCu2Te3 to W electrode for phase change random access memoryen_US
dc.typeArticleen_US
dc.relation.volume47-
dc.identifier.doi10.1016/j.mssp.2016.02.006-
dc.relation.page1-6-
dc.relation.journalMATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING-
dc.contributor.googleauthorShindo, S.-
dc.contributor.googleauthorSutou, Y.-
dc.contributor.googleauthorKoike, J.-
dc.contributor.googleauthorSaito, Y.-
dc.contributor.googleauthorSong, Y. -H.-
dc.relation.code2016001201-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF ELECTRONIC ENGINEERING-
dc.identifier.pidyhsong2008-
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE