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dc.contributor.author김재훈-
dc.date.accessioned2018-04-26T01:33:06Z-
dc.date.available2018-04-26T01:33:06Z-
dc.date.issued2012-12-
dc.identifier.citationIn: Proceedings of the International Display Workshops, Society for Information Display - 19th International Display Workshops 2012, IDW/AD 2012. (Proceedings of the International Display Workshops, 2012, 1:123-125)en_US
dc.identifier.isbn9781627486521-
dc.identifier.issn1883-2490-
dc.identifier.urihttps://pdfs.semanticscholar.org/5ff8/5e3a60c4ce1376cf1c52df7bd7e59eedcf11.pdf-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/70655-
dc.description.abstractWe propose an advanced patterned vertical alignment (PVA) mode with a fast response time through double ultraviolet (UV) exposure to UV curable reactive mesogen (RM) mixed in alignment layer. The double step UV exposures using a photomask divide an active pixel region into two regions with a modified pretilt region and a high elastics deformation energy one.en_US
dc.description.sponsorshipInstitute of Image Information and Television Engineers (ITE),Society for Information Display (SID)en_US
dc.language.isoenen_US
dc.publisherDepartment of Electronics and Computer Engineeringen_US
dc.subjectActive pixelen_US
dc.subjectAlignment layersen_US
dc.subjectDeformation energyen_US
dc.subjectDouble-stepen_US
dc.subjectFast response timeen_US
dc.subjectPatterned vertical alignmenten_US
dc.subjectReactive mesogenen_US
dc.subjectUltraviolet exposureen_US
dc.titleFast Response Time Patterned Vertical Alignment Mode Using Double Step UV Exposureen_US
dc.typeArticleen_US
dc.relation.page--
dc.contributor.googleauthorKim, Dong-Ha-
dc.contributor.googleauthorKim, Youngsik-
dc.contributor.googleauthorLee, Jae Ho-
dc.contributor.googleauthorLee, You-Jin-
dc.contributor.googleauthorYu, Chang-Jae-
dc.contributor.googleauthorKim, Jae-Hoon-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF ELECTRONIC ENGINEERING-
dc.identifier.pidjhoon-


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