Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | William Thomas Nichols | - |
dc.date.accessioned | 2018-04-15T05:40:06Z | - |
dc.date.available | 2018-04-15T05:40:06Z | - |
dc.date.issued | 2011-06 | - |
dc.identifier.citation | Japanese journal of applied physics, v.50, no.6[ | en_US |
dc.identifier.issn | 0021-4922 | - |
dc.identifier.uri | http://iopscience.iop.org/article/10.1143/JJAP.50.06GG08/meta | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11754/66501 | - |
dc.description.abstract | Coupling the imprint mold structure having a self-assembled monolayer (SAM) and a buffer oxide layer (BOL) with a poly(vinyl alcohol) (PVA) resin is investigated for thermal nanoimprint lithography on flexible substrates. The mold structure is SAM/BOL/Cr. Among the buffer oxides tested (SiO2, Al2O3, HfO2), SiO2 results in the most hydrophobic character at the SAM surface of the mold. Water-soluble PVA resin is shown to be an excellent pattern transfer layer due to its clean release from the hydrophobic mold and strong barrier to SF6 etching during subsequent substrate patterning. The combination of SAM/SiO2/Cr mold structure with PVA resin is demonstrated to produce high quality, defect-free nanopatterns on both rigid silicon and flexible poly(ethylene terephthalate) and polyimide substrates. (C) 2011 The Japan Society of Applied Physics | en_US |
dc.description.sponsorship | This research was supported by Basic Science Research Program through the National Research Foundation of Korea(NRF) funded by the Ministry of Education, Science and Technology (2011-0006268) and NBIT Fusion technology R&D program of MKE. | en_US |
dc.language.iso | en | en_US |
dc.publisher | The Japan Society of Applied Physics. | en_US |
dc.relation.ispartofseries | 2011년], pp.06GG08; | - |
dc.subject | FABRICATION | en_US |
dc.subject | MONOLAYERS | en_US |
dc.subject | MEMS | en_US |
dc.subject | MOLD | en_US |
dc.title | Nanosize Patterning with Nanoimprint Lithography Using Poly(vinyl alcohol) Transfer Layer | en_US |
dc.type | Article | en_US |
dc.relation.volume | 50 | - |
dc.identifier.doi | 10.7567/JJAP.50.06GG08 | - |
dc.relation.page | - | - |
dc.relation.journal | JAPANESE JOURNAL OF APPLIED PHYSICS | - |
dc.contributor.googleauthor | Nichols, William T | - |
dc.contributor.googleauthor | Park, In-Sung | - |
dc.contributor.googleauthor | Ahn, Jinho | - |
dc.relation.code | 2011217131 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF MATERIALS SCIENCE AND ENGINEERING | - |
dc.identifier.pid | nichols | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.