Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김성욱 | - |
dc.date.accessioned | 2018-04-13T04:46:02Z | - |
dc.date.available | 2018-04-13T04:46:02Z | - |
dc.date.issued | 2016-07 | - |
dc.identifier.citation | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, v. 15, No. 3, Article no. 033504 | en_US |
dc.identifier.issn | 1932-5150 | - |
dc.identifier.issn | 1932-5134 | - |
dc.identifier.uri | https://www.spiedigitallibrary.org/journals/Journal-of-MicroNanolithography-MEMS-and-MOEMS/volume-15/issue-3/033504/Anisotropic-shadow-effects-with-various-pattern-directions-in-an-anamorphic/10.1117/1.JMM.15.3.033504.full?SSO=1 | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11754/65830 | - |
dc.description.abstract | A high numerical aperture (NA) system with an NA larger than 0.5 is required to make patterns of 1X nm and below, even though extreme ultraviolet lithography uses a 13.5-nm wavelength source. To avoid the reflective efficiency loss and to avoid an increase in the chief ray angle of incident light, use of an anamorphic high-NA system is suggested. The suggested anamorphic NA system has nonisotropic magnification, x-magnification of 4x and y-magnification of 8x, and the mask NA shape is an ellipse due to the nonisotropic magnification distribution. Anamorphic NA systems have a nonconventional shadow effect due to nonisotropic incident angle distribution and magnification. These nonisotropic characteristics lead to the reduction of asymmetric shadow distribution and a reduction of horizontal-vertical bias. As a result, anamorphic NA systems can achieve balanced patterning results regardless of pattern direction and incident direction. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) | en_US |
dc.description.sponsorship | This work was supported by the Future Semiconductor Device Technology Development Program #10052714 funded by Ministry of Trade, Industry and Energy and Korea Semiconductor Research Consortium. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | SPIE-SOC PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | en_US |
dc.subject | extreme ultraviolet lithography | en_US |
dc.subject | anamorphic numerical aperture | en_US |
dc.subject | shadow effects | en_US |
dc.title | Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system | en_US |
dc.type | Article | en_US |
dc.relation.no | 3 | - |
dc.relation.volume | 15 | - |
dc.identifier.doi | 10.1117/1.JMM.15.3.033504 | - |
dc.relation.page | 1-7 | - |
dc.relation.journal | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | - |
dc.contributor.googleauthor | Kim, IS | - |
dc.contributor.googleauthor | Kim, GJ | - |
dc.contributor.googleauthor | Yeung, M | - |
dc.contributor.googleauthor | Barouch, E | - |
dc.contributor.googleauthor | Kim, SW | - |
dc.contributor.googleauthor | Oh, HK | - |
dc.relation.code | 2016007288 | - |
dc.sector.campus | E | - |
dc.sector.daehak | COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E] | - |
dc.sector.department | DEPARTMENT OF APPLIED MATHEMATICS | - |
dc.identifier.pid | seong | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.