Control of electron energy distribution by adding a pulse inductive field in capacitive discharge
- Title
- Control of electron energy distribution by adding a pulse inductive field in capacitive discharge
- Author
- 정진욱
- Keywords
- electron energy distribution; pulsed plasma; plasma parameter; plasma control; PRESSURE RF DISCHARGE; HEATING-MODE TRANSITION; PLASMA; COLLISIONLESS; KINETICS; WAVES
- Issue Date
- 2014-09
- Publisher
- IOP PUBLISHING LTD, TEMPLE CIRCUS, TEMPLE WAY, BRISTOL BS1 6BE, ENGLAND
- Citation
- PLASMA SOURCES SCIENCE & TECHNOLOGY, 2014, 23(6), P.062002-1~062002-6
- Abstract
- Drastic changes in the electron energy distribution (EED) and the plasma parameter caused by a pulse-modulated (PM) inductive field were observed in a low-gas pressure capacitively coupled plasma (CCP). By applying a small amount of the PM inductive power (20 W) in the CCP, the effective electron temperature (T-eff) was increased without a variation of the plasma density (n(e)) due to the low energy electron heating by the inductive field. When a large amount of the PM inductive power of 50 W was applied to the CCP, both the T-eff and the n(e) were increased because of the electron heating through the coupling effect of the inductive and capacitive fields. These results show that T-eff and n(e) can be controlled independently or simultaneously in the plasmas by adding the pulse inductive field.
- URI
- http://iopscience.iop.org/article/10.1088/0963-0252/23/6/062002/metahttp://hdl.handle.net/20.500.11754/57364
- ISSN
- 0963-0252; 1361-6595
- DOI
- 10.1088/0963-0252/23/6/062002
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
- Files in This Item:
There are no files associated with this item.
- Export
- RIS (EndNote)
- XLS (Excel)
- XML