Synthesis of Triphenylsulfonium Triflate Bound Copolymer for Electron Beam Lithography
- Title
- Synthesis of Triphenylsulfonium Triflate Bound Copolymer for Electron Beam Lithography
- Author
- 이해원
- Keywords
- Polymer-Bound PAG; Photoacid Generator; E-Beam Lithography; Negative Tone Photoresist
- Issue Date
- 2014-08
- Publisher
- American Scientific Publishers
- Citation
- Journal of nanoscience and nanotechnology, 2014, 14(8), P.6270-6273
- Abstract
- Photoacid generator (PAG) has been widely used as a key component in photoresist for high-resolution patterning with high sensitivity. A novel acrylic monomer, triphenylsulfonium salt methyl methacrylate (TPSMA), was synthesized and includes triphenylsulfonium triflate as a PAG. The poly(MMA-co-TPSMA) (PMT) as a polymer-bound PAG was synthesized with methyl methacrylate (MMA) and TPSMA for electron beam lithography. Characterization of PMT was carried out by NMR and FTIR. The molecular weight was analyzed by GPC. Thermal properties were studied using TGA and DSC. Thecharacterization results were in good agreement with corresponding chemical compositions and thermal stability. PMT was subsequently employed in electron beam lithography and its lithographic performance was confirmed by FE-SEM. This PMT was accomplished to improve the lithographic performance including sensitivity, line width roughness (LWR) and resolution. We found that PMT was capable of 20 nm negative tone patterns with better sensitivity than hydrogensilsesquioxane (HSQ) which is a conventional negative tone resist.
- URI
- http://www.ingentaconnect.com/content/asp/jnn/2014/00000014/00000008/art00127http://hdl.handle.net/20.500.11754/54203
- ISSN
- 1533-4880
- DOI
- 10.1166/jnn.2014.8826
- Appears in Collections:
- COLLEGE OF NATURAL SCIENCES[S](자연과학대학) > CHEMISTRY(화학과) > Articles
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