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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 1-10 of 12 (Search time: 0.002 seconds).
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Issue Date
Title
Author(s)
2007-09
Which Mask is Preferred for Sub-60 nm Node Imaging?
오혜근
2007-10
Process Extension Techniques for Optical Lithography: Thermal Treatment, Polarization and Double Patterning
오혜근
2006-11
Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography
정희준
2006-11
Investigation of optimum biasing and undercut for single trench alternating phase shift mask in 193 nm lithography
오혜근
2008-11
Heat conduction to photoresist on top of wafer during post exposure bake process: I. Numerical Approach
오혜근
2008-11
A mask generation approach to double patterning technology with inverse lithography
오혜근
2008-11
Heat conduction to photoresist on top of wafer during post exposure bake process:II. Application
오혜근
2008-08
Ellipsometry for Pellicle-Covered Surface
정희준
2008-08
Ellipsometry for Pellicle-Covered Surface
오혜근
2007-04
Resist Reflow Modeling Including Surface Tension and Bulk Effect
오혜근
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오혜근
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double patterning
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lithography simulation
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alternating phase shift mask
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bias
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ellipsometry
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haze
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inverse lithography
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numerical approach
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pellicle
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