| 2003-06 | Angular dependence of collective and quantum effects on elastic electron-ion collisions in strongly coupled semiclassiacl plasmas | 정영대 |
| 2004-11 | Angular dependency of off-axis illumination on 100 nm width pattern printability for extreme ultraviolet lithography: Ru/Mo/Si reflector system | 오혜근 |
| 2002-05 | Anisotropic Coulomb effects on bremsstrahlung emission from bi-Maxwellian plasmas | 정영대 |
| 2004-09 | Anisotropic dielectric properties in epitaxial Bi3.25La0.75Ti3O12 thin films along different crystal directions | 강보수 |
| 2005-03 | Anisotropic plasma effects on elastic electron-ion collisions in an anisotropic plasma | 정영대 |
| 2006-03 | Anisotropic plasma effects on electron capture process in an anisotropic plasma | 정영대 |
| 2006-06 | Anisotropic plasma screening effects on bremsstrahlung spectrum in magnetized anisotropic plasmas | 정영대 |
| 2008-06 | Anisotropic resist reflow process simulation for 22 nm elongated contact holes | 오혜근 |
| 2008-06 | Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes | 홍주유 |
| 2007-11 | Anisotropic resist reflow process simulation for 32 nm node elongated contact holes | 홍주유 |
| 2007-04 | Anisotropic screening effects on elastic eikonal scattering cross section in magnetized plasmas | 정영대 |
| 2005-02 | Anisotropic screening effects on electron-ion bremsstrahlung process in an anisotropic plasma | 정영대 |
| 2016-08 | Anisotropic shadow effects with various pattern directions in an anamorphic high numerical aperture system | 오혜근 |
| 2020-07 | Anisotropic temperature effects on Landau damping in Kappa-Maxwellian astrophysical plasmas | 정영대 |
| 2015-02 | Anomalous Rapid Defect Annihilation in Self-Assembled Nanopatterns by Defect Melting | 손승우 |
| 2014-08 | ANTI-SCREENING OPTICALLY ALLOWED AND FORBIDDEN COLLISIONAL EXCITATIONS IN NONTHERMAL ASTROPHYSICAL PLASMAS | 정영대 |
| 2008-05 | Application of ellipsometry in immersion lithography | 오혜근 |
| 2017-03 | Arc-shaped slit effect of EUV lithography with anamorphic high NA system in terms of critical dimension variation | 오혜근 |
| 2005-06 | ArF photoresist parameter optimization for mask error enhancement factor reduction | 오혜근 |
| 2005-10 | ArF photoresist parameter optimization for mask error enhancement factor reduction | 오혜근 |
