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dc.contributor.author이정호-
dc.date.accessioned2018-03-19T02:30:30Z-
dc.date.available2018-03-19T02:30:30Z-
dc.date.issued2016-01-
dc.identifier.citationTHIN SOLID FILMS, v. 599, Page. 54-58en_US
dc.identifier.issn0040-6090-
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0040609015013127-
dc.identifier.urihttp://hdl.handle.net/20.500.11754/48723-
dc.description.abstractWe employ a thin Al2O3 interlayer between p-NiOX catalyst/n-Si photoanode interfaces to realize an effective oxygen evolution reaction (OER). The Al2O3 interlayer is used to reduce the interface defect density, enhance the band bending by suppressing the Fermi-level pinning effect, and enhance photovoltage at the catalyst/ semiconductor rectifying junction. Our NiOX/Al2O3/n-Si photoanodes generated a photocurrent of 3.36 mA/cm(2) at the equilibrium potential of OER (E-OER = 1.23 V vs. reversible hydrogen electrode in 1 M NaOH solution) and a solar-to-oxygen conversion efficiency of 0.321%. Moreover, the photoanode showed no sign of decay over 20 h of photoelectrochemical water oxidation. (C) 2015 Elsevier B.V. All rights reserved.en_US
dc.description.sponsorshipThis work was supported by the Human Resources Development program (No. 20154030200680) of the New & Renewable Energy of the Korea Institute of Energy Technology Evaluation and Planning(KETEP) grant funded by the Korea government Ministry of Trade, Industry and Energy.en_US
dc.language.isoen_USen_US
dc.publisherELSEVIER SCIENCE SAen_US
dc.subjectSiliconen_US
dc.subjectPhotoanodeen_US
dc.subjectAluminum trioxideen_US
dc.subjectInterlayeren_US
dc.subjectNickel oxideen_US
dc.subjectCatalysten_US
dc.subjectOxygen evolution reactionen_US
dc.subjectPhotoelectrochemical cellen_US
dc.subjectATOMIC LAYER DEPOSITIONen_US
dc.subjectWATER OXIDATIONen_US
dc.subjectSILICON PHOTOANODESen_US
dc.subjectNICKEL-OXIDEen_US
dc.subjectBEHAVIORen_US
dc.subjectFILMSen_US
dc.subjectPERFORMANCEen_US
dc.subjectHEMATITEen_US
dc.subjectCELLSen_US
dc.titlePhotoelectrochemical oxygen evolution improved by a thin Al2O3 interlayer in a NiOx/n-Si photoanodeen_US
dc.typeArticleen_US
dc.relation.volume599-
dc.identifier.doi10.1016/j.tsf.2015.12.062-
dc.relation.page54-58-
dc.relation.journalTHIN SOLID FILMS-
dc.contributor.googleauthorPark, Min-Joon-
dc.contributor.googleauthorJung, Jin-Young-
dc.contributor.googleauthorShin, Sun-Mi-
dc.contributor.googleauthorSong, Jae-Won-
dc.contributor.googleauthorNam, Yoon-Ho-
dc.contributor.googleauthorKim, Dong-Hyung-
dc.contributor.googleauthorLee, Jung-Ho-
dc.relation.code2016003143-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF ENGINEERING SCIENCES[E]-
dc.sector.departmentDEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING-
dc.identifier.pidjungho-
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COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > ETC
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