Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 이정호 | - |
dc.date.accessioned | 2018-03-19T02:30:30Z | - |
dc.date.available | 2018-03-19T02:30:30Z | - |
dc.date.issued | 2016-01 | - |
dc.identifier.citation | THIN SOLID FILMS, v. 599, Page. 54-58 | en_US |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://www.sciencedirect.com/science/article/pii/S0040609015013127 | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11754/48723 | - |
dc.description.abstract | We employ a thin Al2O3 interlayer between p-NiOX catalyst/n-Si photoanode interfaces to realize an effective oxygen evolution reaction (OER). The Al2O3 interlayer is used to reduce the interface defect density, enhance the band bending by suppressing the Fermi-level pinning effect, and enhance photovoltage at the catalyst/ semiconductor rectifying junction. Our NiOX/Al2O3/n-Si photoanodes generated a photocurrent of 3.36 mA/cm(2) at the equilibrium potential of OER (E-OER = 1.23 V vs. reversible hydrogen electrode in 1 M NaOH solution) and a solar-to-oxygen conversion efficiency of 0.321%. Moreover, the photoanode showed no sign of decay over 20 h of photoelectrochemical water oxidation. (C) 2015 Elsevier B.V. All rights reserved. | en_US |
dc.description.sponsorship | This work was supported by the Human Resources Development program (No. 20154030200680) of the New & Renewable Energy of the Korea Institute of Energy Technology Evaluation and Planning(KETEP) grant funded by the Korea government Ministry of Trade, Industry and Energy. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | ELSEVIER SCIENCE SA | en_US |
dc.subject | Silicon | en_US |
dc.subject | Photoanode | en_US |
dc.subject | Aluminum trioxide | en_US |
dc.subject | Interlayer | en_US |
dc.subject | Nickel oxide | en_US |
dc.subject | Catalyst | en_US |
dc.subject | Oxygen evolution reaction | en_US |
dc.subject | Photoelectrochemical cell | en_US |
dc.subject | ATOMIC LAYER DEPOSITION | en_US |
dc.subject | WATER OXIDATION | en_US |
dc.subject | SILICON PHOTOANODES | en_US |
dc.subject | NICKEL-OXIDE | en_US |
dc.subject | BEHAVIOR | en_US |
dc.subject | FILMS | en_US |
dc.subject | PERFORMANCE | en_US |
dc.subject | HEMATITE | en_US |
dc.subject | CELLS | en_US |
dc.title | Photoelectrochemical oxygen evolution improved by a thin Al2O3 interlayer in a NiOx/n-Si photoanode | en_US |
dc.type | Article | en_US |
dc.relation.volume | 599 | - |
dc.identifier.doi | 10.1016/j.tsf.2015.12.062 | - |
dc.relation.page | 54-58 | - |
dc.relation.journal | THIN SOLID FILMS | - |
dc.contributor.googleauthor | Park, Min-Joon | - |
dc.contributor.googleauthor | Jung, Jin-Young | - |
dc.contributor.googleauthor | Shin, Sun-Mi | - |
dc.contributor.googleauthor | Song, Jae-Won | - |
dc.contributor.googleauthor | Nam, Yoon-Ho | - |
dc.contributor.googleauthor | Kim, Dong-Hyung | - |
dc.contributor.googleauthor | Lee, Jung-Ho | - |
dc.relation.code | 2016003143 | - |
dc.sector.campus | E | - |
dc.sector.daehak | COLLEGE OF ENGINEERING SCIENCES[E] | - |
dc.sector.department | DEPARTMENT OF MATERIALS SCIENCE AND CHEMICAL ENGINEERING | - |
dc.identifier.pid | jungho | - |
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