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dc.contributor.author김종만-
dc.date.accessioned2018-03-17T04:27:20Z-
dc.date.available2018-03-17T04:27:20Z-
dc.date.issued2014-04-
dc.identifier.citationJournal Citation Reports, 2014, 84(8), P.808-818en_US
dc.identifier.issn0040-5175-
dc.identifier.issn1746-7748-
dc.identifier.urihttp://journals.sagepub.com/doi/abs/10.1177/0040517513509872?journalCode=trjc-
dc.description.abstractA new photoactive antimicrobial agent was synthesized by introducing a reactive functional group (-CH2CH2OH) to 4,4-bis(dimethylamino)benzophenone (Michler's ketone) that could enhance the fixation of benzophenone derivatives to cotton fabric. Cotton fabrics containing organic photosensitizers were investigated to demonstrate antimicrobial properties in the application to protective and germ-free clothing. Photosensitizers such as benzophenone, Michler's ketone and synthesized (4-(dimethylamino)phenyl)(4-((2-hydroxyethyl)(methyl)amino)phenyl)methanone (MK-EtOH) were applied on cotton fabrics through a pad-dry-cure method. The introduction of the reactive functional groups (-CH2CH2OH) enhanced the fixation of benzophenone derivatives to cotton fabrics as confirmed by Fourier transform infrared spectroscopy analysis and methylene blue staining method. No significant reductions of tensile strength and thermal degradation were observed with cotton fabrics treated with MK-EtOH. The scanning electron microscope morphology of the treated cotton showed that organic photosensitizers were evenly distributed and diffused to cotton fibers. After ultraviolet irradiation (365nm), the cotton fabrics treated with synthesized MK-EtOH photosensitizer provided more effective and durable antimicrobial properties than Michler's ketone and benzophenone, even after multiple washing.en_US
dc.description.sponsorshipThis work was supported by the National Research Foundation of Korea (NRF) grant funded by the Korea government (MEST) (Project Nos. 2012-0002165 and 2012-047656).en_US
dc.language.isoenen_US
dc.publisherSAGE PUBLICATIONS LTDen_US
dc.subjectAntimicrobialen_US
dc.subjectbenzophenone derivativesen_US
dc.subjectcottonen_US
dc.subjectMichler's ketoneen_US
dc.subjectphotosensitizeren_US
dc.titleA novel antimicrobial photosensitizer: hydroxyethyl Michler's ketoneen_US
dc.typeArticleen_US
dc.relation.volume84-
dc.identifier.doi10.1177/0040517513509872-
dc.relation.page808-818-
dc.relation.journalTEXTILE RESEARCH JOURNAL-
dc.contributor.googleauthorOh, Kyung Wha-
dc.contributor.googleauthorChoi, Hyung-Min-
dc.contributor.googleauthorKim, Jong Man-
dc.contributor.googleauthorPark, Ji Hwan-
dc.contributor.googleauthorPark, In Sung-
dc.relation.code2014040151-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF CHEMICAL ENGINEERING-
dc.identifier.pidjmk-
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COLLEGE OF ENGINEERING[S](공과대학) > CHEMICAL ENGINEERING(화학공학과) > Articles
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