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Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas

Title
Study on Plasma Uniformity Using 2-D Measurement Method in Argon Inductively Coupled Plasmas
Author
정진욱
Keywords
ICP; neutral gas depletion; plasma uniformity
Issue Date
2014-08
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 445 HOES LANE, PISCATAWAY, NJ 08855-4141 USA
Citation
IEEE Transactions on Plasma Science, 2014, 42(10), p2858 ~ 2859
Abstract
In this paper, 2-D plasma density profile is measured in an inductively coupled plasma (ICP) with changing rf power and gas pressure. As the ICP power increases at a fixed argon gas pressure of 100 mtorr, increase in the plasma density is observed at the radial edge. It could be understood by the neutral gas depletion in the discharge center and the step-ionization effect.
URI
http://ieeexplore.ieee.org/document/6884864/http://hdl.handle.net/20.500.11754/48098
ISSN
0093-3813
DOI
10.1109/TPS.2014.2331362
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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