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Enhanced Plasma Uniformity in RF Plasma With Side Multihole
- Title
- Enhanced Plasma Uniformity in RF Plasma With Side Multihole
- Author
- 정진욱
- Keywords
- Capacitively coupled plasma (CCP); hollow cathode; plasma uniformity; radio-frequency (RF) gas discharge; DISCHARGES
- Issue Date
- 2014-07
- Publisher
- IEEE
- Citation
- Institute of Electrical and Electronics Engineers, 2014, 42(10), P.2766-2767
- Abstract
- Capacitively coupled plasma source with side multihole is studied. Due to the hollow cathode effect at the multihole, edge plasma density is strongly increased and thus, plasma uniformity is significantly enhanced.
- ISSN
- 0093-3813
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > ELECTRICAL AND BIOMEDICAL ENGINEERING(전기·생체공학부) > Articles
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