Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 이해원 | - |
dc.date.accessioned | 2018-03-14T01:47:20Z | - |
dc.date.available | 2018-03-14T01:47:20Z | - |
dc.date.issued | 2014-07 | - |
dc.identifier.citation | Polymer, 2014, 55(16), P.3599-3604 | en_US |
dc.identifier.issn | 0032-3861 | - |
dc.identifier.uri | http://www.sciencedirect.com/science/article/pii/S0032386114004911?via%3Dihub | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11754/46451 | - |
dc.description.abstract | A new photoacid generator (PAG) bound polymer containing triphenylsulfonium salt methacrylate (TPSMA) was synthesized and characterized. The PAG bound polymer was employed to improve electron beam lithographic performance, including sensitivity and resolution. The PAG bound polymer resist exhibited a higher sensitivity (120 mu C/cm(2)) than the PAG blend polymer resist (300 mu C/cm(2)). Eliminating the post exposure baking process during development improved the resolution due to decreased acid diffusion. A high-resolution pattern fabricated by electron beam lithography had a line width of 15 nm and a high aspect ratio. The newly developed patterns functioned well as masks for transferring patterns on Si substrates by reactive ion etching. (C) 2014 Elsevier Ltd. All rights reserved. | en_US |
dc.description.sponsorship | This research was supported by both the Basic Science Research Program funded by the Ministry of Education (2012R1A6A1029029) and the Technology Innovation Program funded by the Ministry of Knowledge and Economy (No. 10036982). | en_US |
dc.language.iso | en | en_US |
dc.publisher | Elsevier Science LTD | en_US |
dc.subject | Photoacid generator | en_US |
dc.subject | PAG bound polymer | en_US |
dc.subject | Electron beam lithography | en_US |
dc.title | Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography | en_US |
dc.type | Article | en_US |
dc.relation.volume | 55 | - |
dc.identifier.doi | 10.1016/j.polymer.2014.06.008 | - |
dc.relation.page | 3599-3604 | - |
dc.relation.journal | POLYMER | - |
dc.contributor.googleauthor | Yoo, Jae Beom | - |
dc.contributor.googleauthor | Park, Sang-Wook | - |
dc.contributor.googleauthor | Kang, Ha Na | - |
dc.contributor.googleauthor | Mondkar, Hemant | - |
dc.contributor.googleauthor | Sohn, Kyunghwa | - |
dc.contributor.googleauthor | Kim, Hyun-Mi | - |
dc.contributor.googleauthor | Kim, Ki-Bum | - |
dc.contributor.googleauthor | Lee, Haiwon | - |
dc.relation.code | 2014037878 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF NATURAL SCIENCES[S] | - |
dc.sector.department | DEPARTMENT OF CHEMISTRY | - |
dc.identifier.pid | haiwon | - |
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