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dc.contributor.author이승백-
dc.date.accessioned2018-02-28T04:40:04Z-
dc.date.available2018-02-28T04:40:04Z-
dc.date.issued2011-05-
dc.identifier.citationJOURNAL OF THE KOREAN PHYSICAL SOCIETY; MAY 2011, 58 5,1522-1526en_US
dc.identifier.issn0374-4884-
dc.identifier.urihttps://www.kci.go.kr/kciportal/ci/sereArticleSearch/ciSereArtiView.kci?sereArticleSearchBean.artiId=ART001552646-
dc.description.abstractWe report on the dependence of the reduced metallic percolation paths of single-wall carbon-nanotube-network thin-films (SCNTFs) on the channel aspect ratio and the number of strips (N(strip)). A longer channel length (L(C)) and the existence of strips in the channel region limit the number of metallic percolation conducting paths existing between the source and the drain in SCNTF transistors. Increasing the channel aspect ratio threefold resulted in an increase in the on/off current ratio (I(on)/I(off)) by 246%. We also observed that introducing 15 strips into the channel increased I(on)/I(off) by 859%, which was attributed to a reduction in the number of metallic percolation paths formed between the source and the drain. The results show that with a higher aspect ratio and with strips introduced into the channels, the semiconducting behavior of solution-processed SCNTF transistors can be enhanced.en_US
dc.description.sponsorshipThis work was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2010-0024875) and partly by the Global Partnership Program for International Cooperative Research, the International Research and Development Program of the National Research Foundationof Korea (NRF) funded by the Ministry of Education, Science and Technology of Korea (Grant No. K20901000006-09E0100-00610), the Seoul R&BD Program (ST090864), and HY-SDR Research Center at Hanyang University, Seoul, Korea, under the Information Technology Research Center (ITRC) program of the Ministry of Knowledge Economy, Korea.en_US
dc.language.isoenen_US
dc.publisherKOREAN PHYSICAL SOC, 635-4, YUKSAM-DONG, KANGNAM-KU, SEOUL 135-703, SOUTH KOREAen_US
dc.subjectCarbon nanotubeen_US
dc.subjectThin-film transistoren_US
dc.subjectMetallic percolationen_US
dc.subjectSolution processen_US
dc.titleEffective Reduction of Leakage Currents in Single-walled Carbon-nanotube-network Thin-film Transistorsen_US
dc.typeArticleen_US
dc.relation.volume58-
dc.identifier.doi10.3938/jkps.58.1522-
dc.relation.page1522-1526-
dc.relation.journalJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.contributor.googleauthorJeong, Minho-
dc.contributor.googleauthorChoi, Eunsuk-
dc.contributor.googleauthorLee, Kunhak-
dc.contributor.googleauthorKim, Jinoh-
dc.contributor.googleauthorKim, Ahsung-
dc.contributor.googleauthorChun, Sungwoo-
dc.contributor.googleauthorLim, Chaehyun-
dc.contributor.googleauthorLee, Seung-Beck-
dc.relation.code2011205987-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDEPARTMENT OF ELECTRONIC ENGINEERING-
dc.identifier.pidsbl22-
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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