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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
PHOTONICS AND NANOELECTRONICS(나노광전자학과)
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2001-09
Parameter extraction for 193 nm chemically amplified resist from refractive index change
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Amplified deprotection reaction
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Chemically amplified resists
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Computer simulation
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Lithography
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Postexposure bake
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Thickness measurement
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