Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 최창환 | - |
dc.date.accessioned | 2018-02-06T04:27:05Z | - |
dc.date.available | 2018-02-06T04:27:05Z | - |
dc.date.issued | 2011-03 | - |
dc.identifier.citation | ELECTROCHEMICAL AND SOLID STATE LETTERS,권: 14 호: 6 페이지: H241-H243 | en_US |
dc.identifier.issn | 1099-0062 | - |
dc.identifier.uri | http://esl.ecsdl.org/content/14/6/H241 | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11754/35560 | - |
dc.description.abstract | We have investigated the effects of millisecond flash annealing (ms-FLA) on the electrical properties of p-type metal-oxide-semiconductor (pMOS) devices with high-k gate dielectrics with TiN gate. Compared to conventional rapid thermal annealing (RTA), ms-FLA improves pMOS characteristics such as positive flatband voltage (V(FB)) shift along with scaled equivalent oxide thickness (EOT) and negligible gate leakage degradation, attributed to the suppressed oxygen vacancies [V(o)(2+)] generation in high-k gate dielectrics due to a shorter thermal budget. Al-containing capping layers, TiN thickness, and Si cap deposition temperatures with ms-FLA substantially affect thermally generated [V(o)(2+)], leading to different V(FB) and EOT. (C) 2011 The Electrochemical Society. [DOI: 10.1149/1.3566073] All rights reserved. | en_US |
dc.language.iso | en | en_US |
dc.publisher | ELECTROCHEMICAL SOC INC, 65 SOUTH MAIN STREET, PENNINGTON, NJ 08534 USA | en_US |
dc.subject | CMOS | en_US |
dc.title | Millisecond Flash Annealing as a Flatband Voltage Shift Enabler for p-Type Metal-Oxide-Semiconductor Devices with High-k/Metal Gate | en_US |
dc.type | Article | en_US |
dc.relation.no | 6 | - |
dc.relation.volume | 14 | - |
dc.identifier.doi | 10.1149/1.3566073 | - |
dc.relation.page | 241-243 | - |
dc.relation.journal | ELECTROCHEMICAL AND SOLID STATE LETTERS | - |
dc.contributor.googleauthor | Choi, C | - |
dc.contributor.googleauthor | Narayanan, V | - |
dc.relation.code | 2011202779 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF MATERIALS SCIENCE AND ENGINEERING | - |
dc.identifier.pid | cchoi | - |
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