Effect of Ag film thickness on the optical and the electrical properties in CuAlO(2)/Ag/CuAlO(2) multilayer films grown on glass substrates
- Title
- Effect of Ag film thickness on the optical and the electrical properties in CuAlO(2)/Ag/CuAlO(2) multilayer films grown on glass substrates
- Other Titles
- Ag
- Author
- 김태환
- Keywords
- Oxide materials; Thin films; Electronic properties; Optical properties; Atomic force microscopy; AFM; X-ray diffraction
- Issue Date
- 2011-02
- Publisher
- Elsevier B.V.
- Citation
- In Journal of Alloys and Compounds 2011 509(5):2176-2179
- Abstract
- Effects of Ag film thickness on the optical and the electrical properties in CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates were investigated. Atomic force microscopy images showed that Ag films with a thickness of a few nanometers had island structures. X-ray diffraction patterns showed that the phase of the CuAlO2 layer was amorphous. The resistivity of the 40nm-CuAlO2/18nm-Ag/40nm-CuAlO2 multilayer films was 2.8×10?5Ωcm, and the transmittance of the multilayer films with an Ag film thickness of 8nm was approximately 89.16%. These results indicate that CuAlO2/Ag/CuAlO2 multilayer films grown on glass substrates hold promise for potential applications as transparent conducting electrodes in high-efficiency solar cells.
- URI
- http://www.sciencedirect.com/science/article/pii/S0925838810027106?via%3Dihub
- ISSN
- 0925-8388
- DOI
- 10.1016/j.jallcom.2010.10.180
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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