Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
- Title
- Improvement of the thermal stability of nickel silicide using a ruthenium interlayer deposited via remote plasma atomic layer deposition
- Author
- 전형탁
- Keywords
- NISI FILMS; ELECTRICAL CHARACTERIZATION; THIN-FILMS; MONOSILICIDE; NUCLEATION; SUBSTRATE; SYSTEMS; PHASE; NI/SI
- Issue Date
- 2016-03
- Publisher
- A V S AMER INST PHYSICS
- Citation
- JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, v. 34, NO 3, Article number 031502, Page. 502-502
- Abstract
- In this study, the effects of a thin Ru interlayer on the thermal and morphological stability of NiSi have been investigated. Ru and Ni thin films were deposited sequentially to form a Ni/Ru/Si bilayered structure, without breaking the vacuum, by remote plasma atomic layer deposition (RPALD) on a p-type Si wafer. After annealing at various temperatures, the thermal stabilities of the Ni/Ru/Si and Ni/Si structures were investigated by various analysis techniques. The results showed that the sheet resistance of the Ni/Ru/Si sample was consistently lower compared to the Ni/Si sample over the entire temperature range. Although both samples exhibited the formation of NiSi2 phases at an annealing temperature of 800 degrees C, as seen with glancing angle x-ray diffraction, the peaks of the Ni/Ru/Si sample were observed to have much weaker intensities than those obtained for the Ni/Si sample. Moreover, the NiSi film with a Ru interlayer exhibited a better interface and improved surface morphologies compared to the NiSi film without a Ru interlayer. These results show that the phase transformation of NiSi to NiSi(2)was retarded and that the smooth NiSi/Si interface was retained due to the activation energy increment for NiSi(2)nucleation that is caused by adding a Ru interlayer. Hence, it can be said that the Ru interlayer deposited by RPALD can be used to control the phase transformation and physical properties of nickel silicide phases. (C) 2016 American Vacuum Society.
- URI
- http://avs.scitation.org/doi/10.1116/1.4943090http://hdl.handle.net/20.500.11754/35420
- ISSN
- 0734-2101; 1520-8559
- DOI
- 10.1116/1.4943090
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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