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dc.contributor.author오새룬터-
dc.date.accessioned2024-04-04T01:20:17Z-
dc.date.available2024-04-04T01:20:17Z-
dc.date.issued2023-01-10-
dc.identifier.citationADVANCED ELECTRONIC MATERIALSen_US
dc.identifier.issn2199-160Xen_US
dc.identifier.urihttps://onlinelibrary.wiley.com/doi/full/10.1002/aelm.202201109en_US
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/189598-
dc.description.abstractOxide semiconductor transistors control the brightness and color of organic light-emitting diode (OLED) displays in large-screen televisions to portable telecommunications devices. Oxide semiconductor thin-film transistors under driving conditions are required to maintain a steady current through the OLED for constant illuminance. Interestingly, for driving conditions under strong saturation where both gate and drain bias are high, a boosting phenomenon of the drain current is discovered, even with compensation of the threshold voltage. In this paper, the current boosting effect of self-aligned InGaZnO transistors under driving conditions is comprehensively investigated. Based on experimental extraction methods, two distinct regions within the device are identified: an electron-capture-dominant region including electron trapping in the gate insulator and O–O dimer bond-breaking, and an electron-emission-dominant region caused by peroxide formation. A dual-transistor-in-series model is proposed, where each region is modeled as a local transistor. The current boosting phenomena as a function of time are well-reproduced for various channel length devices, which validate the accuracy of the model. Better understanding of the underlying mechanisms enables increased effectiveness of compensation schemes for transistors under long-term current-driving conditions.en_US
dc.description.sponsorshipThis work was supported by in part by the LG Display Company, in part by the National Research Foundation of Korea (NRF) funded by the Ministry of Science and ICT (MSIT) of Korea Government under Grant Nos. 2016R1A5A1012966, 2020R1A2B5B01001979, 2020M3F3A2A01081240, and 2021R1F1A1060444, and in part by the SILVACO.en_US
dc.languageen_USen_US
dc.publisherWILEYen_US
dc.relation.ispartofseriesv. 9, NO 3;1-10-
dc.subjectamorphous InGaZnOen_US
dc.subjectcurrent boostingen_US
dc.subjectdriveren_US
dc.subjectoxide semiconductorsen_US
dc.subjectself‐aligneden_US
dc.subjectthin‐film transistorsen_US
dc.subjectElectric apparatus and materialsen_US
dc.subjectElectric circuitsen_US
dc.subjectElectric networksen_US
dc.subjectTK452-454.4en_US
dc.subjectPhysics QC1-999en_US
dc.titleCurrent Boosting of Self-Aligned Top-Gate Amorphous InGaZnO Thin-Film Transistors under Driving Conditionsen_US
dc.typeArticleen_US
dc.relation.no3-
dc.relation.volume9-
dc.identifier.doi10.1002/aelm.202201109en_US
dc.relation.page1-10-
dc.relation.journalADVANCED ELECTRONIC MATERIALS-
dc.contributor.googleauthorPark, Jingyu-
dc.contributor.googleauthorChoi, Sungju-
dc.contributor.googleauthorKim, Changwook-
dc.contributor.googleauthorShin, Hong Jae-
dc.contributor.googleauthorJeong, Yun Sik-
dc.contributor.googleauthorBae, Jong Uk-
dc.contributor.googleauthorOh, Chang Ho-
dc.contributor.googleauthorOh, Saeroonter-
dc.contributor.googleauthorKim, Dae Hwan-
dc.relation.code2023040870-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF ENGINEERING SCIENCES[E]-
dc.sector.departmentSCHOOL OF ELECTRICAL ENGINEERING-
dc.identifier.pidsroonter-
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > ELECTRICAL ENGINEERING(전자공학부) > Articles
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