Full metadata record
DC Field | Value | Language |
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dc.contributor.author | 조용우 | - |
dc.date.accessioned | 2023-07-17T01:29:50Z | - |
dc.date.available | 2023-07-17T01:29:50Z | - |
dc.date.issued | 2009-04 | - |
dc.identifier.citation | Journal of Nanoscience and Nanotechnology, v. 9, NO. 4, Page. 2603-2606 | - |
dc.identifier.issn | 1533-4880;1533-4899 | - |
dc.identifier.uri | https://www.ingentaconnect.com/content/asp/jnn/2009/00000009/00000004/art00054;jsessionid=3p0ktmjongk1r.x-ic-live-02 | en_US |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/183778 | - |
dc.description.abstract | Utilizing the wafer-scale anodization of a thermally evaporated Ti layer onto a Si substrate, SiOx nanoparticles could be electrochemically nucleated into the pore bottoms of an anodic aluminum oxide. The formation of a Si-containing Ti layer (Ti1-xSix, x < 0.1) was identified between the Al and the silicon substrate by thermal diffusion of Si during the evaporation. Upon prolonged anodization of similar to 1 h after alumina barrier layer touched the Si-containing Ti layer, pyramid-shaped TiOx nanopillars formed underneath the pore bottoms as a result of a curvature inversion of the barrier oxide with Ti migration. These TiOx nanopillars were observed to act as a diffusion route of silicon from the Si-containing Ti layer. Only one SiOx nanoparticle (similar to 8 +/- 5 nm) for each pore was generally precipitated without Ti contamination. This finding suggests a new route which can make SiOx nanoparticles confined within an anodic aluminum oxide template. | - |
dc.description.sponsorship | This work was supported by a grant (No.R01-2005-000-10553-0) from the Basic Research Program of the Korea Science and Engineering Foundation. In addition, we are grateful to the National Nanofab Center for technical assistance. Sang-Won Jee acknowledges financial support from the second-stage BK21 Project in 2007. Jung-Ho Lee gratefully acknowledges Dr. Jinsub Choi for helpful discussion. Correspondence and requests for materials should be addressed to Jung-Ho Lee. | - |
dc.language | en | - |
dc.publisher | American Scientific Publishers | - |
dc.subject | SiOx Nanoparticle | - |
dc.subject | Electrochemical Anodization | - |
dc.subject | Porous Materisls | - |
dc.title | Electrochemical Nucleation of SiOx Nanoparticles into the Pore Bottoms of an Anodic Aluminum Oxide | - |
dc.type | Article | - |
dc.relation.no | 4 | - |
dc.relation.volume | 9 | - |
dc.identifier.doi | 10.1166/jnn.2009.dk18 | - |
dc.relation.page | 2603-2606 | - |
dc.relation.journal | Journal of Nanoscience and Nanotechnology | - |
dc.contributor.googleauthor | Jee, Sang-Won | - |
dc.contributor.googleauthor | Cho, Yong Woo | - |
dc.contributor.googleauthor | Yang, Jun Mo | - |
dc.contributor.googleauthor | Park, Yun Chang | - |
dc.contributor.googleauthor | Lee, Jung-Ho | - |
dc.sector.campus | E | - |
dc.sector.daehak | 공학대학 | - |
dc.sector.department | 재료화학공학과 | - |
dc.identifier.pid | ywcho7 | - |
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