Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 오재응 | - |
dc.date.accessioned | 2023-07-10T01:25:33Z | - |
dc.date.available | 2023-07-10T01:25:33Z | - |
dc.date.issued | 1993-07 | - |
dc.identifier.citation | JOURNAL OF APPLIED PHYSICS, v. 74, NO. 2, Page. 1456-1458 | - |
dc.identifier.issn | 0021-8979;1089-7550 | - |
dc.identifier.uri | https://aip.scitation.org/doi/10.1063/1.354861 | en_US |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/182783 | - |
dc.description.abstract | A material for thermally stable self-aligned silicide technologies has been developed using sequentially deposited Ti/Ta on polycrystalline silicon. At lower annealing temperatures below 1000-degrees-C two separate phases were found by cross-sectional transmission electron microscopy to exist in the form of bilayer TiSi2/TaSi2. The formation of a ternary phase (TiTa)Si2 has been observed at a higher temperature of 1000-degrees-C. Consequently, the ternary (TiTa) Si2 layer could be kept extremely flat, with a sheet resistance of 5 OMEGA/square, even after 1000-degrees-C, 30 min annealing. Cross-sectional transmission electron micrographs of the structure clearly reveal that no agglomeration occurs during the heat treatment. | - |
dc.language | en | - |
dc.publisher | AMER INST PHYSICS | - |
dc.title | THERMALLY STABLE TERNARY TITANIUM-TANTALUM SILICIDE FORMATION ON POLYCRYSTALLINE SILICON | - |
dc.type | Article | - |
dc.relation.no | 2 | - |
dc.relation.volume | 74 | - |
dc.identifier.doi | 10.1063/1.354861 | - |
dc.relation.page | 1456-1458 | - |
dc.relation.journal | JOURNAL OF APPLIED PHYSICS | - |
dc.contributor.googleauthor | CHOI, JS | - |
dc.contributor.googleauthor | PAEK, SH | - |
dc.contributor.googleauthor | HWANG, YS | - |
dc.contributor.googleauthor | KANG, SG | - |
dc.contributor.googleauthor | CHO, HC | - |
dc.contributor.googleauthor | OH, JE | - |
dc.contributor.googleauthor | SHIM, TE | - |
dc.contributor.googleauthor | LEE, SI | - |
dc.contributor.googleauthor | LEE, JK | - |
dc.contributor.googleauthor | LEE, JG | - |
dc.sector.campus | E | - |
dc.sector.daehak | 공학대학 | - |
dc.sector.department | 전자공학부 | - |
dc.identifier.pid | joh | - |
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