Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 박진구 | - |
dc.date.accessioned | 2023-05-24T01:55:17Z | - |
dc.date.available | 2023-05-24T01:55:17Z | - |
dc.date.issued | 2009-00 | - |
dc.identifier.citation | ECS Transactions, v. 25, NO. 5, Page. 203-210 | - |
dc.identifier.issn | 1938-5862;1938-6737 | - |
dc.identifier.uri | https://iopscience.iop.org/article/10.1149/1.3202654 | en_US |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/181260 | - |
dc.description.abstract | The pattern damage-free process window of physical cleaning was investigated by measuring the pattern collapse and particle removal forces using atomic force microscope with a quantitative lateral force calibration method. The pattern collapse forces of amorphous Si (a-Si) with 20 nm in width and 100 nm in height and TiN/black diamond (BD) II/SiCN-SiCO with 80 nm width and 210 nm height on SiO2/Si-substrates were measured. The particle removal forces of silica and PSL with 100, 300, and 500 nm diameters were measured on ozone last Si surface. The damage free cleaning process windows certainly were measured to be 600 and 3000 nN for a-Si and BDII, respectively. | - |
dc.description.sponsorship | The authors would like to thank A. Pacco and L. Q. Toan for the experimental materials support and D. Vanhaeren and P. Eyben for AFM technical support. | - |
dc.language | en | - |
dc.publisher | Electrochemical Society, Inc. | - |
dc.title | Investigation of physical cleaning process window by atomic force microscope | - |
dc.type | Article | - |
dc.relation.no | 5 | - |
dc.relation.volume | 25 | - |
dc.identifier.doi | 10.1149/1.3202654 | - |
dc.relation.page | 203-210 | - |
dc.relation.journal | ECS Transactions | - |
dc.contributor.googleauthor | Kim, Tae Gon | - |
dc.contributor.googleauthor | Wostyn, Kurt | - |
dc.contributor.googleauthor | Beard, Twan | - |
dc.contributor.googleauthor | Park, Jin-Goo | - |
dc.contributor.googleauthor | Mertens, Paul.W. | - |
dc.contributor.googleauthor | Heyns, Marc | - |
dc.sector.campus | E | - |
dc.sector.daehak | 공학대학 | - |
dc.sector.department | 재료화학공학과 | - |
dc.identifier.pid | jgpark | - |
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