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dc.contributor.author박진구-
dc.date.accessioned2023-05-24T00:23:29Z-
dc.date.available2023-05-24T00:23:29Z-
dc.date.issued2015-05-
dc.identifier.citationWear, v. 332-333, Page. 794-799-
dc.identifier.issn0043-1648;1873-2577-
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0043164815001386?via%3Dihuben_US
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/181171-
dc.description.abstractLapping for sapphire substrates was evaluated with respect to material removal modes. Firstly, a 3-body removal mode that consists of diamond slurry and a metal-resin platen was tested. The metal-resin platen was produced by mixing metal particles (Cu, Al, and Sn) and resin. Secondly, we analyzed a 2-body system using a fixed diamond abrasive pad with a low concentration of alumina slurry as a dressing for the pad surface. For each lapping process, we examined the function of the diamond abrasive particles. The fundamental characteristics of each process were observed to suggest optimal conditions for sapphire processing for various applications. (C) 2015 Elsevier B.V. All rights reserved.-
dc.description.sponsorshipThis work was supported by the Future Semiconductor Device Technology Development Program 10045366 funded by MOTIE (Ministry of Trade, Industry & Energy) and KSRC (Korea Semicon?ductor Research Consortium)-
dc.languageen-
dc.publisherElsevier BV-
dc.subjectLapping-
dc.subjectSapphire-
dc.subjectFixed abrasive pad-
dc.subjectDiamond-
dc.subjectMetal-resin platen-
dc.titleComparison between sapphire lapping processes using 2-body and 3-body modes as a function of diamond abrasive size-
dc.typeArticle-
dc.relation.volume332-333-
dc.identifier.doi10.1016/j.wear.2015.02.029-
dc.relation.page794-799-
dc.relation.journalWear-
dc.contributor.googleauthorKim, Hyuk-Min-
dc.contributor.googleauthorPark, Gun-Ho-
dc.contributor.googleauthorSeo, Young-Gil-
dc.contributor.googleauthorMoon, Deog-Ju-
dc.contributor.googleauthorCho, Byoung-Jun-
dc.contributor.googleauthorPark, Jin-Goo-
dc.sector.campusE-
dc.sector.daehak공학대학-
dc.sector.department재료화학공학과-
dc.identifier.pidjgpark-
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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