Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김주호 | - |
dc.date.accessioned | 2021-07-13T01:42:43Z | - |
dc.date.available | 2021-07-13T01:42:43Z | - |
dc.date.issued | 2020-03 | - |
dc.identifier.citation | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v. 38, no. 2, article no. 022801 | en_US |
dc.identifier.issn | 2166-2746 | - |
dc.identifier.uri | https://avs.scitation.org/doi/10.1116/1.5133978 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/162782 | - |
dc.description.abstract | In plasma processing and application, the electron energy distribution function (EEDF) is of fundamental interest because the ion and radical densities related to physical and chemical reactions on the substrate are predominantly governed by the EEDF or electron temperature. In this paper, the effect of low frequency power on the EEDF is investigated when 2 MHz power is added to the plasma originally driven at 13.56 MHz. In a 13.56 MHz operation, the EEDF shows a Maxwellian-like distribution, and as the RF power increases, the electron density increases and the electron temperature decreases. However, when a small amount of 2 MHz power is applied to the 13.56 MHz discharge, the electron density slightly increases and the electron temperature significantly increases. In dual-frequency operation, EEDFs have a low slope of low-energy region and evolve into a Druyvesteyn-like distribution. It turns out that the dual-frequency operation can significantly change the electron temperature. This is consistent with the results calculated using the analytical electron heating model, and the relevant heating mechanism is also presented. | en_US |
dc.description.sponsorship | This work was supported by the National Research Foundation of Korea (Nos. NRF-2019M1A7A1A03087579 and NRF-2017R1A2B4009770) and the Ministry of Trade, Industry & Energy (Nos. 10052861 and 10079532). | en_US |
dc.language.iso | en | en_US |
dc.publisher | A V S AMER INST PHYSICS | en_US |
dc.subject | LARGE-AREA | en_US |
dc.subject | DISCHARGES | en_US |
dc.subject | SEPARATION | en_US |
dc.subject | RESONANCE | en_US |
dc.subject | MODEL | en_US |
dc.title | Effect of low frequency power on the electron energy distribution function in argon inductively coupled plasmas | en_US |
dc.type | Article | en_US |
dc.relation.no | 2 | - |
dc.relation.volume | 38 | - |
dc.identifier.doi | 10.1116/1.5133978 | - |
dc.relation.page | 1-6 | - |
dc.relation.journal | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | - |
dc.contributor.googleauthor | Kim, Ju-Ho | - |
dc.contributor.googleauthor | Kwon, Deuk-Chul | - |
dc.contributor.googleauthor | Chung, Chin-Wook | - |
dc.relation.code | 2020054588 | - |
dc.sector.campus | S | - |
dc.sector.daehak | COLLEGE OF ENGINEERING[S] | - |
dc.sector.department | DIVISION OF ELECTRICAL AND BIOMEDICAL ENGINEERING | - |
dc.identifier.pid | juhokim | - |
dc.identifier.orcid | http://orcid.org/0000-0001-9012-8275 | - |
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