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dc.contributor.author박관규-
dc.date.accessioned2021-05-14T02:20:38Z-
dc.date.available2021-05-14T02:20:38Z-
dc.date.issued2020-03-
dc.identifier.citationIEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, v. 67, no. 4, page. 879-882en_US
dc.identifier.issn0885-3010-
dc.identifier.issn1525-8955-
dc.identifier.urihttps://ieeexplore.ieee.org/document/8890708-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/162039-
dc.description.abstractIn this letter, we report the characteristics of zero-bias capacitive micromachined ultrasonic transducers (CMUTs) in various aspects, considering the transmission and reception sensitivity and evaluation of the long-term stability with ac transmission in immersion. The main idea of the zero-bias CMUT implementation is that the charge is injected by the dielectric charging effects in an insulation layer in the pull-in state. The CMUT was fabricated by a local oxidation of silicon (LOCOS) process, and the insulation layer consists of Si-3 N-4 -SiO2 and SiO2, which have been commonly used in previous studies. A study on the charging effects is reported to quantitatively observe the voltage shift by charge transfer with time dependence at different temperatures and collapsing time dependence. Therefore, we successfully implemented a zero-bias CMUT with a transmission efficiency of 4.62 kPa/V at a center frequency of 7.53 MHz in Si-3 N-4-SiO2 and a transmission efficiency of 6.78 kPa/V at a center frequency of 7.86 MHz in SiO2 immersion.en_US
dc.description.sponsorshipThis work was supported by the National Research Foundation of Korea (NRF) Grant funded by the Korea Government (MSIT) under Grant 2018R1A5A7025522 and Grant 2019R1F1A1062162.en_US
dc.language.isoenen_US
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INCen_US
dc.subjectCapacitive micromachined ultrasonic transducer (CMUT)en_US
dc.subjectdielectric chargingen_US
dc.subjectzero biasen_US
dc.titleComparison of Si3N4-SiO2 and SiO2 Insulation Layer for Zero-Bias CMUT Operation Using Dielectric Charging Effectsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TUFFC.2019.2950902-
dc.relation.page1-4-
dc.relation.journalIEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL-
dc.contributor.googleauthorChoi, Won Young-
dc.contributor.googleauthorLee, Chang Hoon-
dc.contributor.googleauthorKim, Young Hun-
dc.contributor.googleauthorPark, Kwan Kyu-
dc.relation.code2020051424-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDIVISION OF MECHANICAL ENGINEERING-
dc.identifier.pidkwankyu-
dc.identifier.researcherIDAAC-1269-2021-
dc.identifier.orcidhttp://orcid.org/0000-0001-5117-5853-
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COLLEGE OF ENGINEERING[S](공과대학) > MECHANICAL ENGINEERING(기계공학부) > Articles
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