Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 안유민 | - |
dc.date.accessioned | 2021-01-26T03:58:45Z | - |
dc.date.available | 2021-01-26T03:58:45Z | - |
dc.date.issued | 2002-08 | - |
dc.identifier.citation | 한국정밀공학회지, v. 19, no. 8, page. 134-140 | en_US |
dc.identifier.issn | 1225-9071 | - |
dc.identifier.issn | 2287-8769 | - |
dc.identifier.uri | http://www.dbpia.co.kr/journal/articleDetail?nodeId=NODE00853788 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/157518 | - |
dc.description.abstract | Chemical mechanical polishing of aluminum and photoresist using colloidal silica-based slurry was experimented. The effects of slurry pH, silica concentration, and oxidizer (H2O2) concentration on surface and removal rate were studied. The optimum slurry conditions for reduction of micro-scratch were investigated. The optimum chemical mechanical polishing with the colloidal silica-based slurry was compared with conventional chemical mechanical polishing with alumina-based slurry. Chemical mechanical polishing of the aluminum with the colloidal silica-based slurry showed improved result but chemical mechanical polishing of the photoresist did not. The improved result was comparative with that of chemical mechanical polishing with filtered alumina-based slurry which one of desirable methods to reduce the micro-scratch. | en_US |
dc.description.sponsorship | 이 논문은 2000년도 한국학술진흥재단의 지원에 의하여 연구되었으며(KRF-2000-041-E00093), 이에 감사 드립니다. | en_US |
dc.language.iso | ko_KR | en_US |
dc.publisher | 한국정밀공학회 | en_US |
dc.subject | CMP | en_US |
dc.subject | Micro-Scratch | en_US |
dc.subject | Colloidal SiO2-Based Slurry | en_US |
dc.subject | MEMS | en_US |
dc.subject | 화학기계적연마 | en_US |
dc.subject | 미소 스크래치 | en_US |
dc.subject | 콜로이달 실리카 연마액 | en_US |
dc.subject | 마이크로 머신 | en_US |
dc.title | 화학기계적연마 공정에서 미소 스크래치 저발생화를 위한 가공기술 연구 | en_US |
dc.title.alternative | Study on Chemical Mechanical Polishing for Reduction of Micro-Scratch | en_US |
dc.type | Article | en_US |
dc.relation.journal | 한국정밀공학회지 | - |
dc.contributor.googleauthor | 김성준 | - |
dc.contributor.googleauthor | 안유민 | - |
dc.contributor.googleauthor | 백창욱 | - |
dc.contributor.googleauthor | 김용권 | - |
dc.relation.code | 2012101691 | - |
dc.sector.campus | E | - |
dc.sector.daehak | COLLEGE OF ENGINEERING SCIENCES[E] | - |
dc.sector.department | DEPARTMENT OF MECHANICAL ENGINEERING | - |
dc.identifier.pid | ahnym | - |
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