Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 안유민 | - |
dc.date.accessioned | 2021-01-11T04:52:07Z | - |
dc.date.available | 2021-01-11T04:52:07Z | - |
dc.date.issued | 2002-02 | - |
dc.identifier.citation | 한국정밀공학회지, v. 19, no. 2, page. 49-57 | en_US |
dc.identifier.issn | 1225-9071 | - |
dc.identifier.issn | 2287-8769 | - |
dc.identifier.uri | http://www.dbpia.co.kr/journal/articleDetail?nodeId=NODE00851622 | - |
dc.identifier.uri | https://repository.hanyang.ac.kr/handle/20.500.11754/156850 | - |
dc.description.abstract | The effect of mechanical parameters on chemical mechanical polishing (CMP) of blanket and patterned aluminum thin films are investigated. CMP process experiments are conducted using the soft pad and the slurry mainly composed of acid solution and Al2O3 abrasive. The result for the blanket film showed that as the concentration of abrasive in slurry is increased, the surface roughness gets worse but the waviness gets better. The planarity of the patterned Al films is slowly improved by CMP when the width of and gap between the patterns are relatively small. It is tried to find the optimized CMP process conditions by that the patterned Al thin film can be planarized with fine surface. The most satisfiable film surface is obtained when the applied pressure is low (10kPa) and the abrasive concentration is relatively high (5wt.%). | en_US |
dc.description.sponsorship | 이 논문은 1999년도 한국학술진흥재단의 연구비에 의하여 지원되었으며 (KRF-99-041-E00088), 이에 감사드립니다. | en_US |
dc.language.iso | ko_KR | en_US |
dc.publisher | 한국정밀공학회 | en_US |
dc.subject | Chemical mechanical polishing | en_US |
dc.subject | Al thin films | en_US |
dc.subject | Planarity/Waviness | en_US |
dc.subject | Surface roughness | en_US |
dc.subject | Removal rate | en_US |
dc.subject | 화학기계적연마 | en_US |
dc.subject | 알루미늄 박막 | en_US |
dc.subject | 평탄도 | en_US |
dc.subject | 표면거칠기 | en_US |
dc.subject | 소재제거율 | en_US |
dc.title | 알루미늄 박막의 화학기계적연마 가공에 관한 연구 | en_US |
dc.title.alternative | Chemical Mechanical Polishing of Aluminum Thin Films | en_US |
dc.type | Article | en_US |
dc.relation.journal | 한국정밀공학회지 | - |
dc.contributor.googleauthor | 조웅 | - |
dc.contributor.googleauthor | 안유민 | - |
dc.contributor.googleauthor | 백창욱 | - |
dc.contributor.googleauthor | 김용권 | - |
dc.relation.code | 2012101691 | - |
dc.sector.campus | E | - |
dc.sector.daehak | COLLEGE OF ENGINEERING SCIENCES[E] | - |
dc.sector.department | DEPARTMENT OF MECHANICAL ENGINEERING | - |
dc.identifier.pid | ahnym | - |
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