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dc.contributor.author안일신-
dc.date.accessioned2020-11-11T06:10:57Z-
dc.date.available2020-11-11T06:10:57Z-
dc.date.issued2003-03-
dc.identifier.citationJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, v.42, Issue.3, page.1416-1417en_US
dc.identifier.issn0021-4922-
dc.identifier.urihttps://iopscience.iop.org/article/10.1143/JJAP.42.1416-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/155400-
dc.description.abstractSpectroscopic ellipsometry (SE) and X-ray photoelectron spectroscopy (XPS) were employed to study the composite thin films of SiO and cobalt (Co) prepared by sputtering technique. The optical properties of these films could be expressed as mixtures of SiO and Co using effective medium approximation (EMA) by Bruggeman. When the compositional properties of films analyzed by EMA and XPS were compared, the optical volume of SiO was found to be 5.47 times greater than that of Co.en_US
dc.language.isoen_USen_US
dc.publisherINST PURE APPLIED PHYSICSen_US
dc.subjectSiOen_US
dc.subjectcobalten_US
dc.subjectellipsometryen_US
dc.subjecteffective medium theoryen_US
dc.titleOptical Properties of the SiO-Co Composite Thin Filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/jjap.42.1416-
dc.relation.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES &-
dc.contributor.googleauthorLee, J.-
dc.contributor.googleauthorBang, K.-Y.-
dc.contributor.googleauthorKim, O.-K.-
dc.contributor.googleauthorOh, H.-K.-
dc.contributor.googleauthorAn, I.-
dc.contributor.googleauthorChoi, C.-
dc.contributor.googleauthorPark, C.-W.-
dc.relation.code2012204500-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E]-
dc.sector.departmentDEPARTMENT OF PHOTONICS AND NANOELECTRONICS-
dc.identifier.pidilsin-


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