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dc.contributor.author최창환-
dc.date.accessioned2020-10-08T07:10:47Z-
dc.date.available2020-10-08T07:10:47Z-
dc.date.issued2019-10-
dc.identifier.citationJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v. 19, no. 10, Page. 6083-6086en_US
dc.identifier.issn1533-4880-
dc.identifier.issn1533-4899-
dc.identifier.urihttps://www.ingentaconnect.com/content/asp/jnn/2019/00000019/00000010/art00014-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/154490-
dc.description.abstractIn this paper, the dependency of low frequency noise as a function of the gate voltage was examined for tunneling field effect transistors (TFETs). When the level of gate voltage is low, the tunneling width of the TFETs is large. Thus, electrons move via the trap instead of tunneling directly. On the other hand, when the level of gate voltage is high, the tunneling width of the TFETs becomes narrow. Thus, when the gate voltage is low, the noise level of TFETs is high because electrons pass through the trap. However, when the gate voltage is high, electrons pass directly from valence band of source to conduction band of drain, so the noise level is low. Finding the voltage suitable for this TFET is important to determine the optimum conditions for generating BTBT when measuring TFETs and to reduce noise.en_US
dc.description.sponsorshipThis research was supported by the Ministry of Trade, Industry and Energy (MOTIE) (10067808) and the Korea Semiconductor Research Consortium (KSRC) support program for the development of future semiconductor devices. It was also supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Science, ICT and Future Planning (NRF-2015M3A7B7045563).en_US
dc.language.isoenen_US
dc.publisherAMER SCIENTIFIC PUBLISHERSen_US
dc.subjectTunneling Field Effect Transistorsen_US
dc.subjectLow Frequency Noise (LFN)en_US
dc.titleGate Voltage Dependence of Low Frequency Noise in Tunneling Field Effect Transistorsen_US
dc.typeArticleen_US
dc.relation.no10-
dc.relation.volume19-
dc.identifier.doi10.1166/jnn.2019.16989-
dc.relation.page6083-6086-
dc.relation.journalJOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY-
dc.contributor.googleauthorKim, So-Yeong-
dc.contributor.googleauthorSong, Hyeong-Sub-
dc.contributor.googleauthorKwon, Sung-Kyu-
dc.contributor.googleauthorLim, Dong-Hwan-
dc.contributor.googleauthorChoi, Chang-Hwan-
dc.contributor.googleauthorLee, Ga-Won-
dc.contributor.googleauthorLee, Hi-Deok-
dc.relation.code2019037685-
dc.sector.campusS-
dc.sector.daehakCOLLEGE OF ENGINEERING[S]-
dc.sector.departmentDIVISION OF MATERIALS SCIENCE AND ENGINEERING-
dc.identifier.pidcchoi-
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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