용액공정에 의한 그래핀 투명 전도성 코팅에 관한 연구

Abstract

This study has developed techniques to disperse and exfoliate pristine graphene using surfactants without oxidation or defect formation. The as-produced graphene by surfactant was dispersed in DMAc at concentrations up to 1.06wt%. This result was relatively high, comapared with the previous study. To remove the surfactants, this study was attempted to wash the sample using MeOH instead of annealing. The removal amounts of residual surfactant can be confirmed experimentally through the yields, conductivity and TGA. The sheet resistance of the graphene film is higher than before annealing others. In this study, the preparation condition of dispersed graphene solution by surfactants was optimized. DOC could disperse well the graphene when compared with SDS and SDBS. The optimum ratio of graphite to surfactants was determined to be 5 to 1 for the all surfactants. After determining the optimum dispersion condition of graphite, this dispersed graphene solutions can be used to prepare free-standing graphene films. And then, the sheet resistance of graphene films was measured. The measurement of the sheet resistance on GD101-CU(aw) film was 3.0kΩ/sq.